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Choi, W.K.

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Full Name
Choi, W.K.
Variants
Choi, W.-K.
Choi Wee Kion
Choi, Wee kiong
Choi, W.K
Choi, W.
Choi Wee Kiong
Choi, W.K.
 
Main Affiliation
 
Faculty
 
Email
elechoi@nus.edu.sg
 

Publications

Refined By:
Date Issued:  [2000 TO 2009]

Results 61-80 of 111 (Search time: 0.005 seconds).

Issue DateTitleAuthor(s)
611-Jan-2002Microstructural characterization of rf sputtered polycrystalline silicon germanium filmsChoi, W.K. ; Teh, L.K.; Bera, L.K. ; Chim, W.K. ; Wee, A.T.S. ; Jie, Y.X. 
6231-May-2004Minimization of germanium penetration, nanocrystal formation, charge storage, and retention in a trilayer memory structure with silicon nitride/hafnium dioxide stack as the tunnel dielectricNg, T.H.; Chim, W.K. ; Choi, W.K. ; Ho, V.; Teo, L.W.; Du, A.Y.; Tung, C.H.
63Oct-2003Monitoring Oxide Quality Using the Spread of the dC/dV Peak in Scanning Capacitance Microscopy MeasurementsChim, W.K. ; Wong, K.M. ; Yeow, Y.T.; Hong, Y.D.; Lei, Y. ; Teo, L.W.; Choi, W.K. 
642004Mortality dependence of Cu dual damascene interconnects on adjacent segmentChang, C.W.; Gan, C.L.; Thompson, C.V.; Pey, K.L.; Choi, W.K. ; Hwang, N.
652005Multi-via electromigration test structures for identification and characterization of different failure mechanismsChoi, Z.-S.; Chang, C.W.; Lee, J.H.; Gan, C.L.; Thompson, C.V.; Pey, K.L.; Choi, W.K. 
66Nov-2001N2O oxidation of strained-Si/relaxed-SiGe heterostructure grown by UHVCVDTan, C.S.; Choi, W.K. ; Bera, L.K. ; Pey, K.L. ; Antoniadis, D.A.; Fitzgerald, E.A.; Currie, M.T.; Maiti, C.K.
672006Native point defects in yttria and relevance to its use as a high-dielectric-constant gate oxide material: First-principles studyZheng, J.X.; Ceder, G.; Maxisch, T.; Chim, W.K. ; Choi, W.K. 
6820-Nov-2002Nickel silicidation on polycrystalline silicon germanium filmsChoi, W.K. ; Pey, K.L. ; Zhao, H.B.; Osipowicz, T. ; Shen, Z.X. 
6924-Mar-2003Nitride-mediated epitaxy of CoSi2 on Si(001)Chong, R.K.K.; Yeadon, M. ; Choi, W.K. ; Stach, E.A.; Boothroyd, C.B.
7018-Mar-2002Observation of memory effect in germanium nanocrystals embedded in an amorphous silicon oxide matrix of a metal-insulator-semiconductor structureChoi, W.K. ; Chim, W.K. ; Heng, C.L.; Teo, L.W.; Ho, V.; Ng, V. ; Antoniadis, D.A.; Fitzgerald, E.A.
71Dec-2001Optical characterization of as-prepared and rapid thermal oxidized partially strain compensated Si1-x-y GexCy filmsFeng, W.; Choi, W.K. ; Bera, L.K. ; Ji, M.; Yang, C.Y.
722000Optical properties of hydrogenated amorphous silicon carbide filmsChoi, W.K. 
7315-Mar-2004Origin of charge trapping in germanium nanocrystal embedded SiO 2 system: Role of interfacial traps?Kan, E.W.H.; Choi, W.K. ; Chim, W.K. ; Fitzgerald, E.A.; Antoniadis, D.A.
74Jul-2004Over-erase phenomenon in SONOS-type flash memory and its minimization using a hafnium oxide charge storage layerTan, Y.-N.; Chim, W.-K. ; Cho, B.J. ; Choi, W.-K. 
752001Oxidation study of hydrogenated amorphous silicon carbide filmsChoi, W.K. ; Lee, L.P.; Leoy, C.C.
761-Feb-2001Oxidation study of plasma-enhanced chemical vapor deposited and rf sputtered hydrogenated amorphous silicon carbide filmsChoi, W.K. ; Lee, L.P.; Foo, S.L.; Gangadharan, S.; Chong, N.B.; Tan, L.S. 
7720-Nov-2002Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium filmsLeoy, C.C.; Kan, E.W.H.; Arianto, J.; Choi, W.K. ; Wee, A.T.S. ; Liu, Y.J. 
781-Jul-2003Physical and electrical characterization of HfO2 metal-insulator-metal capacitors for Si analog circuit applicationsHu, H.; Zhu, C. ; Lu, Y.F. ; Wu, Y.H. ; Liew, T. ; Li, M.F. ; Cho, B.J. ; Choi, W.K. ; Yakovlev, N.
792002Quantum mechanical modeling of capacitance and gate current for MIS structures using zirconium dioxide as the gate dielectricKoh, B.H.; Ng, T.H.; Zheng, J.X.; Chim, W.K. ; Choi, W.K. 
801-May-2004Quantum mechanical modeling of gate capacitance and gate current in tunnel dielectric stack structures for nonvolatile memory applicationKoh, B.H.; Chim, W.K. ; Ng, T.H.; Zheng, J.X.; Choi, W.K.