Full Name
Choi, W.K.
Variants
Choi, W.-K.
Choi Wee Kion
Choi, Wee kiong
Choi, W.K
Choi, W.
Choi Wee Kiong
Choi, W.K.
 
 
Email
elechoi@nus.edu.sg
 

Publications

Refined By:
Date Issued:  [2000 TO 2009]

Results 21-40 of 115 (Search time: 0.006 seconds).

Issue DateTitleAuthor(s)
2127-Oct-2003Effect of germanium concentration and tunnel oxide thickness on nanocrystal formation and charge storage/retention characteristics of a trilayer memory structureHo, V.; Teo, L.W.; Choi, W.K. ; Chim, W.K. ; Tay, M.S.; Antoniadis, D.A.; Fitzgerald, E.A.; Du, A.Y.; Tung, C.H.; Liu, R. ; Wee, A.T.S. 
221-Aug-2005Effect of Pt on agglomeration and Ge out diffusion in Ni(Pt) germanosilicideJin, L.J.; Pey, K.L.; Choi, W.K. ; Fitzgerald, E.A.; Antoniadis, D.A.; Pitera, A.J.; Lee, M.L.; Chi, D.Z.; Rahman, Md.A.; Osipowicz, T. ; Tung, C.H.
232007Effects of microvoids on the linewidth dependence of electromigration failure of dual-damascene copper interconnectsChang, C.W.; Thompson, C.V.; Gan, C.L.; Pey, K.L.; Choi, W.K. ; Lim, Y.K.
24Apr-2003Effects of rapid thermal annealing time and ambient temperature on the charge storage capability of SiO2/pure Ge/rapid thermal oxide memory structureHeng, C.L.; Teo, L.W.; Ho, V.; Tay, M.S.; Lei, Y.; Choi, W.K. ; Chim, W.K. 
2515-Mar-2000Effects of RF power and annealing on the electrical and structural properties of sputtered amorphous silicon carbide filmsChoi, W.K. ; Chong, N.B.; Tan, L.S. ; Han, L.J.
26Apr-2003Electrical characterization of a trilayer germanium nanocrystal memory deviceHo, V.; Tay, M.S.; Moey, C.H.; Teo, L.W.; Choi, W.K. ; Chim, W.K. ; Heng, C.L.; Lei, Y.
2710-May-2006Electrical characterization of platinum and palladium effects in nickel monosilicide/n-Si Schottky contactsJin, L.J.; Pey, K.L.; Choi, W.K. ; Antoniadis, D.A.; Fitzgerald, E.A.; Chi, D.Z.
28Mar-2001Electrical properties of crystalline YSZ films on silicon as alternative gate dielectricsWang, S.J. ; Ong, C.K. ; Xu, S.Y. ; Chen, P. ; Tjiu, W.C.; Huan, A.C.H.; Yoo, W.J. ; Lim, J.S.; Feng, W.; Choi, W.K. 
2910-Jul-2000Electrical properties of rapid thermal oxides on Si1-x-yGexCy filmsBera, L.K. ; Choi, W.K. ; Feng, W.; Yang, C.Y.; Mi, J.
301-May-2006Electromigration resistance in a short three-contact interconnect treeChang, C.W.; Choi, Z.-S.; Thompson, C.V.; Gan, C.L.; Pey, K.L.; Choi, W.K. ; Hwang, N.
31Jan-2001Evolution of hillocks during silicon etching in TMAHThong, J.T.L. ; Luo, P.; Choi, W.K. ; Tan, S.C.
3215-Jul-2003Experimental characterization and modeling of the reliability of three-terminal dual-damascene Cu interconnect treesGan, C.L.; Thompson, C.V.; Pey, K.L.; Choi, W.K. 
332002Experimental characterization of the reliability of 3-terminal dual-damascene copper interconnect treesGan, C.L.; Thompson, C.V.; Pey, K.L. ; Choi, W.K. ; Wei, F.; Yu, B.; Hau-Riege, S.P.
342003Experimental characterization of the reliability of multi-terminal dual-damascene copper interconnect treesGan, C.L.; Thompson, C.V.; Pey, K.L.; Choi, W.K. ; Chang, C.W.; Guo, Q.
35Nov-2000Experimental investigation of flow friction for liquid flow in microchannelsXu, B.; Ooi, K.T.; Wong, N.T.; Choi, W.K. 
36Sep-2004Fabrication and characterization of a trilayer germanium nanocrystal memory device with hafnium dioxide as the tunnel dielectricNg, T.H.; Ho, V.; Teo, L.W.; Tay, M.S.; Koh, B.H.; Chim, W.K. ; Choi, W.K. ; Du, A.Y.; Tung, C.H.
37Aug-2006Fabrication of germanium nanowires by oblique angle depositionChew, H.G.; Choi, W.K. ; Chim, W.K.; Fitzgerald, E.A.
382001Factors affecting Ge nanocrystal size in co-sputtered Ge+SiO2 filmsChoi, W.K. ; Ng, V. ; Ho, Y.W.; Chen, T.B.; Ho, V.
3914-Mar-2007First-principles study of native point defects in hafnia and zirconiaZheng, J.X.; Ceder, G.; Maxisch, T.; Chim, W.K. ; Choi, W.K. 
402-Feb-2006Formation of germanium nanocrystals in thick silicon oxide matrix on silicon substrate under rapid thermal annealingChoi, W.K. ; Chew, H.G.; Ho, V.; Ng, V. ; Chim, W.K. ; Ho, Y.W.; Ng, S.P.