Full Name
YOO WON JONG
Variants
Yoo, W.-J.
Won, J.Y.
Jong, Y.W.
Yoo, W.J.
Jong Yoo, W.
 
 
 
Email
eleyoowj@nus.edu.sg
 

Results 1-20 of 57 (Search time: 0.004 seconds).

Issue DateTitleAuthor(s)
120043D GOI CMOSFETs with novel IrO 2(Hf) dual gates and high-κ dielectric on 1P6M-0.18μm-CMOSYu, D.S.; Chin, A. ; Laio, C.C.; Lee, C.F.; Cheng, C.F.; Chen, W.J.; Zhu, C. ; Li, M.-F. ; Yoo, W.J. ; McAlister, S.P.; Kwong, D.L.
2Mar-2005A novel program-erasable high-k AlN-Si MIS capacitorLai, C.H.; Chin, A.; Hung, B.F.; Cheng, C.F.; Yoo, W.J. ; Li, M.F. ; Zhu, C. ; McAlister, S.P.; Kwong, D.-L.
32006Chemical analysis of etching residues in metal gate stack for CMOS processWan, S.H.; Hui, H.N.; Won, J.Y. ; Bliznetsov, V.
42005Chemical vapor deposition of germanium nanocrystals on hafnium oxide for non-volatile memory applicationsWang, Y.Q.; Chen, J.H. ; Yoo, W.J. ; Yeo, Y.-C. 
52006Chemically assisted formation of nanocrystals for micro-electronics applicationTan, Z.; Gupta, R.; Samanta, S.K. ; Lee, S. ; Won, J.Y. 
612-Mar-2001Crystalline zirconia oxide on silicon as alternative gate dielectricsWang, S.J. ; Ong, C.K. ; Xu, S.Y. ; Chen, P. ; Tjiu, W.C.; Chai, J.W.; Huan, A.C.H.; Yoo, W.J. ; Lim, J.S.; Feng, W.; Choi, W.K. 
7Jul-2004Direct trim etching process of Si/SiO2 gate stacks using 193 nm ArF patternsTan, K.M.; Yoo, W.J. ; Ma, H.H.H. ; Li, F.; Chan, L.
8Sep-2006Drive-current enhancement in FinFETs using gate-induced stressTan, K.-M.; Liow, T.-Y.; Lee, R.T.P. ; Tung, C.-H.; Samudra, G.S. ; Yoo, W.-J. ; Yeo, Y.-C. 
92005Effect of electric field on chemical bonds of carbon-doped silicon oxide as evidenced by in situ Fourier transform infrared spectroscopyYiang, K.Y.; Yoo, W.J. ; Krishnamoorthy, A.
10Oct-2005Effect of porosity on electrical stability of hydrocarbon polymeric low-k dielectricYiang, K.Y.; Yoo, W.J. ; Krishnamoorthy, A.
112004Effects of Annealing and Ar Ion Bombardment on the Removal of HfO 2 Gate DielectricChen, J. ; Yoo, W.J. ; Chan, D.S.H. ; Kwong, D.-L.
12Jan-2006Effects of N2, O2, and Ar plasma treatments on the removal of crystallized HfO2 filmChen, J. ; Yoo, W.J. ; Chan, D.S.H. 
132002Effects of poly-Si annealing on gate oxide charging damage in Poly-Si gate etching processChong, D.; Yoo, W.J. ; Chan, L.; See, A.
142004Electric field-enhanced degradation of porous methylsilsesquioxane polymer as observed by in situ FTIRSYiang, K.Y.; Yoo, W.J. ; Krishnamoorthy, A.
15Mar-2001Electrical properties of crystalline YSZ films on silicon as alternative gate dielectricsWang, S.J. ; Ong, C.K. ; Xu, S.Y. ; Chen, P. ; Tjiu, W.C.; Huan, A.C.H.; Yoo, W.J. ; Lim, J.S.; Feng, W.; Choi, W.K. 
16Aug-2004Enhancement of adhesion strength of Cu layer on single and multi-layer dielectric film stack in Cu/low k multi-level interconnectsBalakumar, S.; Wong, G.; Tsang, C.F.; Hara, T.; Yoo, W.J. 
17Sep-2004Enhancement of adhesion strength of Cu seed layer with different thickness in Cu/low-k multilevel interconnectsWang, G.; Jong, Y.W. ; Balakumar, S.; Seah, C.H.; Hara, T.
182005Enhancement of memory window in short channel non-volatile memory devices using double layer tungsten nanocrystalsSamanta, S.K. ; Singh, P.K.; Yoo, W.J. ; Samudra, G. ; Yeo, Y.-C. ; Bera, L.K.; Balasubramanian, N.
191-Jul-2005Formation of dual-phase HfO 2-Hf xSi 1-xO 2 dielectric and its application in memory devicesWang, Y.Q.; Chen, J.H. ; Yoo, W.J. ; Yeo, Y.-C. ; Chin, A.; Du, A.Y.
2028-Jun-2004Formation of Ge nanocrystals in HfAlO high-k dielectric and application in memory deviceWang, Y.Q.; Chen, J.H. ; Yoo, W.J. ; Yeo, Y.-C. ; Kim, S.J. ; Gupta, R.; Tan, Z.Y.L.; Kwong, D.-L.; Du, A.Y.; Balasubramanian, N.