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https://scholarbank.nus.edu.sg/handle/10635/69599
| Title: | Chemical analysis of etching residues in metal gate stack for CMOS process | Authors: | Wan, S.H. Hui, H.N. Won, J.Y. Bliznetsov, V. |
Issue Date: | 2006 | Citation: | Wan, S.H.,Hui, H.N.,Won, J.Y.,Bliznetsov, V. (2006). Chemical analysis of etching residues in metal gate stack for CMOS process. Studies in Surface Science and Catalysis 159 : 365-368. ScholarBank@NUS Repository. | Source Title: | Studies in Surface Science and Catalysis | URI: | http://scholarbank.nus.edu.sg/handle/10635/69599 | ISSN: | 01672991 |
| Appears in Collections: | Staff Publications |
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