Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/69599
Title: Chemical analysis of etching residues in metal gate stack for CMOS process
Authors: Wan, S.H.
Hui, H.N.
Won, J.Y. 
Bliznetsov, V.
Issue Date: 2006
Source: Wan, S.H.,Hui, H.N.,Won, J.Y.,Bliznetsov, V. (2006). Chemical analysis of etching residues in metal gate stack for CMOS process. Studies in Surface Science and Catalysis 159 : 365-368. ScholarBank@NUS Repository.
Source Title: Studies in Surface Science and Catalysis
URI: http://scholarbank.nus.edu.sg/handle/10635/69599
ISSN: 01672991
Appears in Collections:Staff Publications

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