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|Title:||Optical properties of hydrogenated amorphous silicon carbide films||Authors:||Choi, W.K.||Issue Date:||2000||Citation:||Choi, W.K. (2000). Optical properties of hydrogenated amorphous silicon carbide films. Diffusion and Defect Data. Pt A Defect and Diffusion Forum 177 : 29-42. ScholarBank@NUS Repository.||Abstract:||The influence of plasma enhanced chemical vapour deposition conditions (rf power, hydrogen dilution), hydrocarbon source material, dopants and deposition techniques on the optical properties of hydrogenated amorphous silicon carbide (a-Si1-xCx:H) films were examined. The parameters used for the discussion were the optical gap, the refractive index and the edge width parameter. The photoluminescence results of a-Si1-xCx:H films were also presented in this paper.||Source Title:||Diffusion and Defect Data. Pt A Defect and Diffusion Forum||URI:||http://scholarbank.nus.edu.sg/handle/10635/80902||ISSN:||10120386|
|Appears in Collections:||Staff Publications|
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