Full Name
Choi, W.K.
Variants
Choi, W.-K.
Choi Wee Kion
Choi, Wee kiong
Choi, W.K
Choi, W.
Choi Wee Kiong
Choi, W.K.
 
 
 
Email
elechoi@nus.edu.sg
 

Publications

Results 61-80 of 169 (Search time: 0.005 seconds).

Issue DateTitleAuthor(s)
6114-Mar-2007First-principles study of native point defects in hafnia and zirconiaZheng, J.X.; Ceder, G.; Maxisch, T.; Chim, W.K. ; Choi, W.K. 
22-Feb-2006Formation of germanium nanocrystals in thick silicon oxide matrix on silicon substrate under rapid thermal annealingChoi, W.K. ; Chew, H.G.; Ho, V.; Ng, V. ; Chim, W.K. ; Ho, Y.W.; Ng, S.P.
3Apr-1999Formation of pyramids at surface of TMAH etched siliconChoi, W.K. ; Thong, J.T.L. ; Luo, P.; Bai, Y. ; Tan, C.M.; Chua, T.H.
42007Full range workfunction tunning of MOSFETs using interfacial yttrium layer in fully germanided Ni gateYu, H.P.; Pey, K.L.; Choi, W.K. ; Antoniadis, D.A.; Fitzgerald, E.A.; Dawood, M.K.; Ow, K.Q.; Chi, D.Z.
654-Apr-2005Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealingChoi, W.K. ; Ho, V.; Ng, V. ; Ho, Y.W.; Ng, S.P.; Chim, W.K. 
66Apr-2006Hafnium aluminum oxide as charge storage and blocking-oxide layers in SONOS-type nonvolatile memory for high-speed operationTan, Y.N.; Chim, W.K. ; Choi, W.K. ; Joo, M.S. ; Cho, B.J. 
6714-Apr-2012Hierarchical materials synthesis at soft all-aqueous interfacesSophia Lee, S.H.; Dawood, M.K.; Choi, W.K. ; Alan Hatton, T.; Khan, S.A. 
8Aug-2001High quality gate dielectrics grown by rapid thermal processing using split-N 2O technique on strained-Si 0.91Ge 0.09 filmsBera, L.K. ; Choi, W.K. ; Tan, C.S.; Samanta, S.K.; Maiti, C.K.
1692004High-K HfAlO charge trapping layer in SONOS-type nonvolatile memory device for high speed operationTan, Y.N.; Chim, W.K. ; Choi, W.K. ; Joo, M.S. ; Ng, T.H.; Cho, B.J. 
17015-May-2005Highly oriented Ni(Pd)SiGe formation at 400 °cJin, L.J.; Pey, K.L.; Choi, W.K. ; Fitzgerald, E.A.; Antoniadis, D.A.; Pitera, A.J.; Lee, M.L.; Tung, C.H.
171Jul-1994Hot-electron degradation in NMOSFET's: Results from temperature annealLing, C.H. ; Ah, L.K.; Choi, W.K. ; Tan, S.E.; Ang, D.S. 
1220-Nov-2002ICP etching and structure study of PECVD SiC filmsShi, J. ; Choi, W.K. ; Chor, E.F. 
1320-Mar-2002ICP etching of RF sputtered and PECVD silicon carbide filmsShi, J. ; Chor, E.F. ; Choi, W.K. 
1416-Dec-2005In situ transmission electron microscopy study on the formation and evolution of germanium nanoclusters and nanoparticles in silicon oxide matrixChoi, W.K. ; Foo, Y.L.; Ho, V.; Nath, R.
154-Feb-2013Influence of nanoscale geometry on the dynamics of wicking into a rough surfaceQuan Lai, C.; Thi Mai, T.; Zheng, H.; Lee, P.S. ; Leong, K.C.; Lee, C. ; Choi, W.K. 
1614-Feb-2007Influence of reductant and germanium concentration on the growth and stress development of germanium nanocrystals in silicon oxide matrixChew, H.G.; Zheng, F.; Choi, W.K. ; Chim, W.K. ; Foo, Y.L.; Fitzgerald, E.A.
172008Influence of substrate geometry on the distribution and stress on Ge nanocrystals in silicon oxide matrixZheng, F.; Choi, W.K. ; Liew, T.H. 
181999Infra-red, X-ray photoelectron spectroscopy and electrical studies of r.f. sputtered amorphous silicon carbide filmsHan, L.J.; Ong, T.Y.; Prakash, S. ; Chua, L.G.; Choi, W.K. ; Tan, L.S. ; Loh, F.C. ; Tan, K.L. 
191-May-1998Infrared and x-ray photoelectron spectroscopy studies of as-prepared and furnace-annealed radio-frequency sputtered amorphous silicon carbide filmsChoi, W.K. ; Ong, T.Y.; Tan, L.S. ; Loh, F.C. ; Tan, K.L. 
2015-Apr-2003Interfacial and bulk properties of zirconium dioxide as a gate dielectric in metal-insulator-semiconductor structures and current transport mechanismsChim, W.K. ; Ng, T.H.; Koh, B.H.; Choi, W.K. ; Zheng, J.X.; Tung, C.H.; Du, A.Y.