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|Title:||Formation of pyramids at surface of TMAH etched silicon||Authors:||Choi, W.K.
Tetramethylammonium hydroxide (TMAH)
|Issue Date:||Apr-1999||Citation:||Choi, W.K.,Thong, J.T.L.,Luo, P.,Bai, Y.,Tan, C.M.,Chua, T.H. (1999-04). Formation of pyramids at surface of TMAH etched silicon. Applied Surface Science 144-145 (0) : 472-475. ScholarBank@NUS Repository.||Abstract:||An investigation on the influence of etchant concentration and ambient temperature on the formation of pyramids arising from the TMAH etching of silicon has been carried out. The number and size of the pyramids were used as parameters for the investigation. From the results obtained from this study, we are able to explain the influence of the TMAH concentration and ambient temperature on the changes occurring at the silicon surface satisfactorily using the pH theory. © 1999 Elsevier Science B.V. All rights reserved.||Source Title:||Applied Surface Science||URI:||http://scholarbank.nus.edu.sg/handle/10635/58302||ISSN:||01694332|
|Appears in Collections:||Staff Publications|
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