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Cho Byung-Jin

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Full Name
Cho Byung-Jin
(not current staff)
Variants
Cho, Byung Jin
CHO, BYUNG JIN
Cho, B.
Cho, B.J.
Cho, B.C.
Cho, Byung-Jin
Byung, J.C.
Cho, B.-J.
 
Main Affiliation
 
Faculty
 
Email
elebjcho@nus.edu.sg
 

Publications

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Department:  COLLEGE OF DESIGN AND ENGINEERING
Author:  Cho, B.J.

Results 21-40 of 42 (Search time: 0.007 seconds).

Issue DateTitleAuthor(s)
21Nov-2005Integrated high-κ (κ ∼ 19) MIM capacitor with Cu/ low-κ interconnects for RF applicationYu, M.B.; Xiong, Y.Z.; Kim, S.-J. ; Balakumar, S.; Zhu, C. ; Li, M.-F. ; Cho, B.-J. ; Lo, G.Q.; Balasubramanian, N.; Kwong, D.-L.
22Jul-2003Lanthanide (Tb)-doped HfO2 for high-density MIM capacitorsKim, S.J. ; Cho, B.J. ; Li, M.-F. ; Zhu, C. ; Chin, A.; Kwong, D.-L.
23Feb-2004Laser annealing of silicon nanocrystal films formed by pulsed-laser depositionTan, C.F.; Chen, X.Y.; Lu, Y.F.; Wu, Y.H. ; Cho, B.J. ; Zeng, J.N. 
24Jul-2004Laser annealing of silicon nanocrystal films prepared by pulsed-laser depositionChen, X.Y.; Lu, Y.F. ; Wu, Y.H. ; Cho, B.J. ; Yang, B.J.; Liew, T.Y.F. 
252002Laser microprocessing in microelectronics, data storage and photonicsLu, Y.F. ; Song, W.D. ; Ren, Z.M.; An, C.W.; Liu, D.M.; Huang, S.M.; Wang, W.J. ; Hong, M.H. ; Chong, T.C. ; Cho, B.J. ; Zeng, J.N. ; Tan, C.F.
262003Material and electrical characterization of HfO2 films for MIM capacitors applicationHu, H.; Zhu, C. ; Lu, Y.F. ; Wu, Y.H. ; Liew, T. ; Li, M.F. ; Cho, B.J. ; Choi, W.K. ; Yakovlev, N.
2715-May-2003Mechanisms of photoluminescence from silicon nanocrystals formed by pulsed-laser deposition in argon and oxygen ambientChen, X.Y.; Lu, Y.F.; Wu, Y.H. ; Cho, B.J. ; Liu, M.H. ; Dai, D.Y.; Song, W.D. 
28Sep-2005Metal-insulator-metal RF bypass capacitor using niobium oxide (Nb2O5) with HfO2/Al2O3 barriersKim, S.-J. ; Cho, B.J. ; Yu, M.B.; Li, M.-F. ; Xiong, Y.-Z.; Zhu, C. ; Chin, A. ; Kwong, D.-L.
29Feb-2003MIM capacitors using atomic-layer-deposited high-κ (HfO2)1-x(Al2O3)x dielectricsHu, H.; Zhu, C. ; Yu, X.; Chin, A. ; Li, M.F. ; Cho, B.J. ; Kwong, D.-L.; Foo, P.D.; Yu, M.B.; Liu, X.; Winkler, J.
302003MIM capacitors with HfO2 and HfAlOx for Si RF and analog applicationsYu, X.; Zhu, C. ; Hu, H.; Chin, A.; Li, M.F. ; Cho, B.J. ; Kwong, D.-L.; Foo, P.D.; Yu, M.B.
3115-Sep-2004Optical properties of SiO x nanostructured films by pulsed-laser deposition at different substrate temperaturesChen, X.Y.; Lu, Y.F.; Wu, Y.H. ; Cho, B.J. ; Song, W.D.; Dai, D.Y.
3212-Aug-2002Pattern-induced ripple structures at silicon-oxide/silicon interface by excimer laser irradiationChen, X.Y.; Lu, Y.F. ; Cho, B.J. ; Zeng, Y.P.; Zeng, J.N. ; Wu, Y.H. 
332003Photoluminescence from Silicon Nanocrystals Formed by Pulsed-Laser DepositionChen, X.Y.; Lu, Y.F.; Wu, Y.H. ; Cho, B.J. ; Song, W.D. ; Hu, H.
341-Jul-2003Physical and electrical characterization of HfO2 metal-insulator-metal capacitors for Si analog circuit applicationsHu, H.; Zhu, C. ; Lu, Y.F. ; Wu, Y.H. ; Liew, T. ; Li, M.F. ; Cho, B.J. ; Choi, W.K. ; Yakovlev, N.
35Jun-2003PVD HfO2 for high-precision MIM capacitor applicationsKim, S.J. ; Cho, B.J. ; Li, M.F. ; Yu, X.; Zhu, C. ; Chin, A.; Kwong, D.-L.
36Jun-2004RF, DC, and reliability characteristics of ALD HfO2-Al2O3 laminate MIM capacitors for Si RF IC applicationsDing, S.-J. ; Hu, H.; Zhu, C. ; Kim, S.J. ; Yu, X.; Li, M.-F. ; Cho, B.J. ; Chan, D.S.H. ; Yu, M.B.; Rustagi, S.C.; Chin, A.; Kwong, D.-L.
372003Silicon Nanostructured Films Formed by Pulsed-Laser Deposition in Inert Gas and Reactive GasChen, X.Y.; Lu, Y.F. ; Wu, Y.H. ; Cho, B.J. ; Hu, H.
382003The mechanisms of photoluminescence from Si nanocrystals formed by pulsed-laser depositionChen, X.Y.; Lu, Y.F.; Wu, Y.H. ; Cho, B.J. 
394-Nov-2002Thermal stability of (HfO2)x(Al2O 3)1-x on SiYu, H.Y. ; Wu, N.; Li, M.F. ; Zhu, C. ; Cho, B.J. ; Kwong, D.-L.; Tung, C.H.; Pan, J.S.; Chai, J.W.; Wang, W.D.; Chi, D.Z.; Ang, C.H.; Zheng, J.Z.; Ramanathan, S.
40Oct-2003Very high density RF MIM capacitors (17 fF/μm2) using high-κ Al2O3 doped Ta2O5 dielectricsYang, M.Y.; Huang, C.H.; Chin, A.; Zhu, C. ; Cho, B.J. ; Li, M.F. ; Kwong, D.-L.