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Choi, W.K.

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Full Name
Choi, W.K.
Variants
Choi, W.-K.
Choi Wee Kion
Choi, Wee kiong
Choi, W.K
Choi, W.
Choi Wee Kiong
Choi, W.K.
 
Faculty
 
Email
elechoi@nus.edu.sg
 

Publications

Refined By:
Date Issued:  [2000 TO 2009]
Date Issued:  2001

Results 1-20 of 20 (Search time: 0.004 seconds).

Issue DateTitleAuthor(s)
118-May-2001Characterisation of Ge nanocrystals in co-sputtered Ge+SiO2 system using raman spectroscopy, RBS and TEMHo, Y.W.; Ng, V. ; Choi, W.K. ; Ng, S.P.; Osipowicz, T. ; Seng, H.L. ; Tjui, W.W.; Li, K.
212-Mar-2001Crystalline zirconia oxide on silicon as alternative gate dielectricsWang, S.J. ; Ong, C.K. ; Xu, S.Y. ; Chen, P. ; Tjiu, W.C.; Chai, J.W.; Huan, A.C.H.; Yoo, W.J. ; Lim, J.S.; Feng, W.; Choi, W.K. 
331-Dec-2001Effect of current direction on the lifetime of different levels of Cu dual-damascene metallizationGan, C.L.; Thompson, C.V.; Pey, K.L. ; Choi, W.K. ; Tay, H.L.; Yu, B.; Radhakrishnan, M.K.
4Mar-2001Electrical properties of crystalline YSZ films on silicon as alternative gate dielectricsWang, S.J. ; Ong, C.K. ; Xu, S.Y. ; Chen, P. ; Tjiu, W.C.; Huan, A.C.H.; Yoo, W.J. ; Lim, J.S.; Feng, W.; Choi, W.K. 
5Jan-2001Evolution of hillocks during silicon etching in TMAHThong, J.T.L. ; Luo, P.; Choi, W.K. ; Tan, S.C.
62001Factors affecting Ge nanocrystal size in co-sputtered Ge+SiO2 filmsChoi, W.K. ; Ng, V. ; Ho, Y.W.; Chen, T.B.; Ho, V.
7Aug-2001High quality gate dielectrics grown by rapid thermal processing using split-N 2O technique on strained-Si 0.91Ge 0.09 filmsBera, L.K. ; Choi, W.K. ; Tan, C.S.; Samanta, S.K.; Maiti, C.K.
818-May-2001Investigation of Ge nanocrystal formation in SiO2-Ge-SiO2 sandwich structureChoi, W.K. ; Ng, V. ; Swee, V.S.L.; Ong, C.S.; Yu, M.B.; Rusli; Yoon, S.F.
915-Feb-2001Microstructural and photoluminescence studies of germanium nanocrystals in amorphous silicon oxide filmsChoi, W.K. ; Ho, Y.W.; Ng, S.P.; Ng, V. 
10Nov-2001N2O oxidation of strained-Si/relaxed-SiGe heterostructure grown by UHVCVDTan, C.S.; Choi, W.K. ; Bera, L.K. ; Pey, K.L. ; Antoniadis, D.A.; Fitzgerald, E.A.; Currie, M.T.; Maiti, C.K.
11Dec-2001Optical characterization of as-prepared and rapid thermal oxidized partially strain compensated Si1-x-y GexCy filmsFeng, W.; Choi, W.K. ; Bera, L.K. ; Ji, M.; Yang, C.Y.
122001Oxidation study of hydrogenated amorphous silicon carbide filmsChoi, W.K. ; Lee, L.P.; Leoy, C.C.
131-Feb-2001Oxidation study of plasma-enhanced chemical vapor deposited and rf sputtered hydrogenated amorphous silicon carbide filmsChoi, W.K. ; Lee, L.P.; Foo, S.L.; Gangadharan, S.; Chong, N.B.; Tan, L.S. 
1420-Oct-2001Raman and photoluminescence characterization of Ge nanocrystals in co-sputtered Ge + SiO2 systemChoi, W.K ; Ng, V. ; Ho, Y.W; Ng, S.P; Chen, T.B; Yu, M.B; Rusli; Yoon, S.F; Cheong, B.A; Chen, G.L
15Jan-2001Random telegraphic signals and low-frequency noise in rapid-thermal-annealed silicon-silicon oxide structuresChim, W.K. ; Leong, K.K.; Choi, W.K. 
16Nov-2001Rapid thermal oxidation of radio frequency sputtered polycrystalline Si1-xGex thin filmsNatarajan, A.; Bera, L.K. ; Choi, W.K. ; Osipowicz, T. ; Seng, H.L. 
172001RHEED and XPS studies of the decomposition of silicon dioxide by the bombardment of metal ionsWang, S.J. ; Ong, C.K. ; Xu, S.Y. ; Chen, P. ; Chai, J.W.; Tjiu, W.C.; Pan, J.S.; Huan, A.C.H.; Feng, W.; Lim, J.S.; Yoo, W.J. ; Choi, W.K. 
18Dec-2001Spectroscopic ellipsometry and electrical studies of as-grown and rapid thermal oxidized Si1-x-yGexCy filmsChoi, W.K. ; Feng, W.; Bera, L.K. ; Yang, C.Y.; Mi, J.
192001Structural and electrical characterizations of oxynitride films on solid phase epitaxially grown silicon carbideBera, L.K. ; Choi, W.K. ; McNeill, D.; Ray, S.K.; Chatterjee, S.; Maiti, C.K.
20Nov-2001Structural characterisation of polycrystalline SiGe thin filmTeh, L.K.; Choi, W.K. ; Bera, L.K. ; Chim, W.K.