1. ScholarBank@NUS

See Kai Hung,Alex

rp08032

Collaboration Map View Statistics Email Alert RSS Feed

Profile

Full Name
See Kai Hung,Alex
(not current staff)
Variants
See, A.
See, A.K.
See, K.H.
SEE, ALEX
 
Main Affiliation
 
Faculty
 
Email
physeea@nus.edu.sg
 

Publications

Results 1-17 of 17 (Search time: 0.004 seconds).

Issue DateTitleAuthor(s)
12000Application of excimer laser annealing in the formation of ultra-shallow p+/n junctionsChong, Y.F.; Pey, K.L. ; Wee, A.T.S. ; See, A. ; Tung, C.-H. ; Gopalakrishnan, R. ; Lu, Y.F. 
22001Direct formation of C54 phase on the basis of C40 TiSi2 and its applications in deep sub-micron technologyChen, S.Y.; Shen, Z.X. ; Xu, S.Y. ; See, A.K. ; Chan, L.H.; Li, W.S. 
32001Effect of transmission line pulsing of interconnects investigated using combined low-frequency noise and resistance measurementsChu, L.W.; Chim, W.K. ; Pey, K.L. ; See, A. 
41999Enhancement of hot-carrier injection resistance for deep submicron transistor gate dielectric with a powered solenoidCha, C.-L.; Tee, K.-C.; Chor, E.-F. ; Gong, H. ; Prasad, K.; Bourdillon, A.J. ; See, A. ; Chan, L.; Lee, M.M.-O.
5Sep-2002Evaluation of the silicon capping technique in SIMSNg, C.M.; Wee, A.T.S. ; Huan, C.H.A.; Ho, C.S.; Yakovlev, N.; See, A. 
61999Impact of voids in Ti-salicided p+ polysilicon lines on TiSi2 electrical propertiesChua, H.N.; Pey, K.L. ; Siah, S.Y.; Ong, L.Y.; Lim, E.H.; Gan, C.L.; See, K.H. ; Ho, C.S.
72000Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PIDCha, C.L.; Vassiliev, V.; Chor, E.F. ; See, A.K. 
82001In-line plasma induced charging monitor for 0.15μm polysilicon gate etchingChong, D.; Won Jong Yoo; Ting Cheong Ang; Sang Yee Loong; Cha, R.; Pin Hian Lee; Layadi, N.; Chan, L.; See, A. 
9Dec-2001Laser-induced titanium disilicide formation for submicron technologiesChong, Y.F.; Pey, K.L. ; Wee, A.T.S. ; See, A. ; Shen, Z.X. ; Tung, C.-H. ; Gopalakrishnan, R. ; Lu, Y.F. 
102001Mask error enhancement factor for sub 0.13μm lithographyTan, S.K.; Lin, Q.; Quan, C. ; Tay, C.J. ; See, A. 
111-Jan-2002Method to form MOS transistors with shallow junctions using laser annealingCHONG, YUNG FU; PEY, KIN LEONG ; SEE, ALEX ; WEE, ANDREW THYE SHEN 
12Dec-2001Nickel silicide formation on Si(100) and poly-Si with a presilicide N2 + implantationLee, P.S.; Mangelinck, D.; Pey, K.L. ; Ding, J. ; Chi, D.Z.; Dai, J.Y.; See, A. 
1321-May-2002Process flow for a performance enhanced MOSFET with self-aligned, recessed channelSNEELAL, SNEEDHARAN PILLAI; POH, FRANCIS YOUG WEE; LEE, JAMES YONG MENG; SEE, ALEX ; LAU, C. K. ; SAMUDRA, GANESH SHANKAR 
1415-Aug-2006Process flow for a performance enhanced MOSFET with self-aligned, recessed channelSNEELAL, SNEEDHARAN PILLAI; POH, FRANCIS; LEE, JAMES; SEE, ALEX ; LAU, C. K. ; SAMUDRA, GANESH SHANKAR 
152000Steep retrograde indium channel profiling for high performance nMOSFETs device fabricationOng, S.Y.; Chor, E.F. ; Leung, Y.K.; Lee, J.; Li, W.S. ; See, A. ; Chan, L.
162002Synthesis of pure C40 TiSi2 for Si wafer fabricationChen, S.Y.; Shen, Z.X. ; Xu, S.Y. ; See, A.K. ; Chan, L.H.; Li, W.S. 
172000Ultra shallow depth profiling of B deltas in Si using a CAMECA IMS 6fNg, C.M.; Wee, A.T.S. ; Huan, C.H.A. ; See, A.