Full Name
Choi, W.K.
Variants
Choi, W.-K.
Choi Wee Kion
Choi, Wee kiong
Choi, W.K
Choi, W.
Choi Wee Kiong
Choi, W.K.
 
 
 
Email
elechoi@nus.edu.sg
 

Publications

Results 21-40 of 169 (Search time: 0.005 seconds).

Issue DateTitleAuthor(s)
21Jul-2011Creation of nanostructures by interference lithography for modulation of cell behaviorZhu, M.; Zhou, L. ; Li, B. ; Dawood, M.K.; Wan, G. ; Lai, C.Q.; Cheng, H.; Leong, K.C.; Rajagopalan, R. ; Too, H.P.; Choi, W.K. 
212-Mar-2001Crystalline zirconia oxide on silicon as alternative gate dielectricsWang, S.J. ; Ong, C.K. ; Xu, S.Y. ; Chen, P. ; Tjiu, W.C.; Chai, J.W.; Huan, A.C.H.; Yoo, W.J. ; Lim, J.S.; Feng, W.; Choi, W.K. 
315-Feb-1998Densification of radio frequency sputtered silicon oxide films by rapid thermal annealingChoi, W.K. ; Choo, C.K.; Han, K.K.; Chen, J.H. ; Loh, F.C. ; Tan, K.L. 
42000Determination of minority carrier diffusion lengths in the denuded zones of silicon wafers by surface photovoltage measurementsTan, L.S. ; Koh, S.H.; Prakash, S. ; Choi, W.K. ; Zhang, Z.
523-Dec-2013Droplet spreading on a two-dimensional wicking surfaceLai, C.Q.; Mai, T.T.; Zheng, H.; Lee, P.S. ; Leong, K.C.; Lee, C. ; Choi, W.K. 
67-Aug-2012Dynamics of wicking in silicon nanopillars fabricated with interference lithography and metal-assisted chemical etchingMai, T.T.; Lai, C.Q.; Zheng, H.; Balasubramanian, K.; Leong, K.C.; Lee, P.S. ; Lee, C. ; Choi, W.K. 
78-Sep-2003Effect of annealing profile on defect annihilation, crystallinity and size distribution of germanium nanodots in silicon oxide matrixKan, E.W.H.; Choi, W.K. ; Leoy, C.C.; Chim, W.K. ; Antoniadis, D.A.; Fitzgerald, E.A.
831-Dec-2001Effect of current direction on the lifetime of different levels of Cu dual-damascene metallizationGan, C.L.; Thompson, C.V.; Pey, K.L. ; Choi, W.K. ; Tay, H.L.; Yu, B.; Radhakrishnan, M.K.
92003Effect of current distribution on the reliability of multi-terminal Cu dual-damascene interconnect treesGan, C.L.; Thompson, C.V.; Pey, K.L.; Choi, W.K. ; Chang, C.W.; Guo, Q.
10May-1999Effect of etchant concentration and defects on pyramid formation in TMAH etched siliconChoi, W.K. ; Thong, J.T.L. ; Bai, Y. ; Newaskar, P.; Luo, P.
1128-Apr-2006Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrixChew, H.G.; Choi, W.K. ; Foo, Y.L.; Zheng, F.; Chim, W.K. ; Voon, Z.J.; Seow, K.C.; Fitzgerald, E.A.; Lai, D.M.Y.
1227-Oct-2003Effect of germanium concentration and tunnel oxide thickness on nanocrystal formation and charge storage/retention characteristics of a trilayer memory structureHo, V.; Teo, L.W.; Choi, W.K. ; Chim, W.K. ; Tay, M.S.; Antoniadis, D.A.; Fitzgerald, E.A.; Du, A.Y.; Tung, C.H.; Liu, R. ; Wee, A.T.S. 
131-Aug-2005Effect of Pt on agglomeration and Ge out diffusion in Ni(Pt) germanosilicideJin, L.J.; Pey, K.L.; Choi, W.K. ; Fitzgerald, E.A.; Antoniadis, D.A.; Pitera, A.J.; Lee, M.L.; Chi, D.Z.; Rahman, Md.A.; Osipowicz, T. ; Tung, C.H.
141995Effect of rapid thermal annealing on the structural and electrical properties of a silicon-silicon oxide systemChoi, W.K. ; Chan, Y.M.; Ah, L.K.; Loh, F.C. ; Tan, K.L. ; Ramam, A. 
151-Aug-1996Effects of hydrogen and rf power on the structural and electrical properties of rf sputtered hydrogenated amorphous silicon carbide filmsChoi, W.K. ; Loo, F.L.; Loh, F.C. ; Tan, K.L. 
162007Effects of microvoids on the linewidth dependence of electromigration failure of dual-damascene copper interconnectsChang, C.W.; Thompson, C.V.; Gan, C.L.; Pey, K.L.; Choi, W.K. ; Lim, Y.K.
17Apr-2003Effects of rapid thermal annealing time and ambient temperature on the charge storage capability of SiO2/pure Ge/rapid thermal oxide memory structureHeng, C.L.; Teo, L.W.; Ho, V.; Tay, M.S.; Lei, Y.; Choi, W.K. ; Chim, W.K. 
1815-Mar-2000Effects of RF power and annealing on the electrical and structural properties of sputtered amorphous silicon carbide filmsChoi, W.K. ; Chong, N.B.; Tan, L.S. ; Han, L.J.
191998Electrical and structural properties of rapid thermal annealed amorphous silicon carbide filmsChoi, W.K. ; Ong, T.Y.; Han, L.J.; Loh, F.C. ; Tan, K.L. 
201999Electrical and structural properties of rapid thermal annealed RF sputtered silicon oxide filmsChoi, W.K. ; Han, K.K.; Chim, W.K.