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Chen Jingde

rp08145

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Full Name
Chen Jingde
(not current staff)
Variants
CHEN, JINGDE
Chen, J.
JINGDE CHEN N.
JINGDE CHEN
Chen, J.D.
JINGDE, CHEN
Chen, J.-D.
 
Main Affiliation
 
Faculty
 
Email
elechenj@nus.edu.sg
 
Other emails
 

Publications

Refined By:
Author:  Zhu, C.

Results 1-9 of 9 (Search time: 0.005 seconds).

Issue DateTitleAuthor(s)
12009Effective modulation of quadratic voltage coefficient of capacitance in MIM capacitors using Sm2O3SiO2 dielectric stackYang, J.-J.; Chen, J.-D. ; Wise, R.; Steinmann, P.; Yu, M.-B.; Kwong, D.-L.; Li, M.-F.; Yeo, Y.-C. ; Zhu, C. 
2Oct-2004Low temperature MOSFET technology with Schottky barrier source/drain, high-K gate dielectric and metal gate electrodeZhu, S. ; Yu, H.Y. ; Chen, J.D. ; Whang, S.J. ; Chen, J.H. ; Shen, C.; Zhu, C. ; Lee, S.J. ; Li, M.F. ; Chan, D.S.H. ; Yoo, W.J. ; Du, A.; Tung, C.H.; Singh, J.; Chin, A.; Kwong, D.L.
3Aug-2004N-type Schottky barrier source/drain MOSFET using Ytterbium silicideZhu, S. ; Chen, J. ; Li, M.-F. ; Lee, S.J. ; Singh, J.; Zhu, C.X. ; Du, A.; Tung, C.H.; Chin, A.; Kwong, D.L.
4Oct-2009Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formationYang, J.-J.; Chen, J.-D. ; Wise, R.; Yeo, Y.-C. ; Zhu, C. 
52009Physical and electrical characterization of metal-insulator-metal capacitors with Sm2O3 and Sm2 O3/SiO2 laminated dielectrics for analog circuit applicationsChen, J.-D. ; Yang, J.-J.; Wise, R.; Steinmann, P.; Yu, M.-B.; Zhu, C. ; Yeo, Y.-C. 
617-Mar-2009Schottky barrier source/drain n-mosfet using ytterbium silicideZHU, SHIYANG ; CHEN, JINGDE ; LEE, SUNGJOO ; LI, MING FU ; SINGH, JAGAR; ZHU, CHUNXIANG ; KWONG, DIM-LEE 
72004Schottky s/d MOSFETs with high-Kgate dielectrics and metal gate electrodesZhu, S. ; Chen, J. ; Yu, H.Y. ; Whang, S.J. ; Chen, J.H. ; Shen, C.; Li, M.F. ; Lee, S.J. ; Zhu, C. ; Chan, D.S.H. ; Du, A.; Tung, C.H.; Singh, J.; Chin, A.; Kwong, D.L.
8Dec-2011Some issues in advanced CMOS gate stack performance and reliabilityLi, M.-F. ; Wang, X.P.; Shen, C.; Yang, J.J.; Chen, J.D. ; Yu, H.Y.; Zhu, C. ; Huang, D.
9Jan-2008Widely tunable work function TaN/Ru stacking layer on HfLaO gate dielectricWang, X.P.; Li, M.-F. ; Yu, H.Y.; Yang, J.J.; Chen, J.D. ; Zhu, C.X. ; Du, A.Y.; Loh, W.Y.; Biesemans, S.; Chin, A.; Lo, G.Q.; Kwong, D.-L.