Full Name
Cho Byung-Jin
(not current staff)
Variants
Cho, Byung Jin
CHO, BYUNG JIN
Cho, B.
Cho, B.J.
Cho, B.C.
Cho, Byung-Jin
Byung, J.C.
Cho, B.-J.
 
 
 
Email
elebjcho@nus.edu.sg
 

Refined By:
Author:  Cho, B.J.
Date Issued:  2002

Results 1-12 of 12 (Search time: 0.003 seconds).

Issue DateTitleAuthor(s)
1Sep-2002A high performance MIM capacitor using HfO 2 dielectricsHu, H.; Zhu, C. ; Lu, Y.F. ; Li, M.F. ; Cho, B.J. ; Choi, W.K. 
22002Advanced laser applications in microelectronics and data storage devices (invited)Lu, Y.F.; Song, W.D. ; Ren, Z.M.; An, C.W.; Liu, D.M.; Wang, W.J. ; Cho, B.J. ; Zeng, J.N. ; Tan, C.F.
38-Jul-2002Correlation between interface traps and gate oxide leakage current in the direct tunneling regimeLoh, W.Y. ; Cho, B.J. ; Li, M.F. 
48-Jul-2002Energy gap and band alignment for (HfO2)x(Al 2O3)1-x on (100) SiYu, H.Y. ; Li, M.F. ; Cho, B.J. ; Yeo, C.C.; Joo, M.S. ; Kwong, D.-L.; Pan, J.S.; Ang, C.H.; Zheng, J.Z.; Ramanathan, S.
515-Apr-2002Evolution of quasi-breakdown in thin gate oxidesLoh, W.Y. ; Cho, B.J. ; Li, M.F. 
62002Hot-carrier lifetime dependence on channel width and silicon recess depth in n-channel metal-oxide-semiconductor field-effect-transistors with the recessed local oxidation of silicon isolation structureChim, W.K. ; Cho, B.J. ; Yue, J.M.P.
7Jun-2002Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETsLek, C.M.; Cho, B.J. ; Ang, C.H.; Tan, S.S.; Loh, W.Y. ; Zhen, J.Z.; Lap, C.
8May-2002Investigation of quasi-breakdown mechanism through post-quasi-breakdown thermal annealingLoh, W.Y. ; Cho, B.J. ; Li, M.F. 
92002Laser microprocessing in microelectronics, data storage and photonicsLu, Y.F. ; Song, W.D. ; Ren, Z.M.; An, C.W.; Liu, D.M.; Huang, S.M.; Wang, W.J. ; Hong, M.H. ; Chong, T.C. ; Cho, B.J. ; Zeng, J.N. ; Tan, C.F.
1012-Aug-2002Pattern-induced ripple structures at silicon-oxide/silicon interface by excimer laser irradiationChen, X.Y.; Lu, Y.F. ; Cho, B.J. ; Zeng, Y.P.; Zeng, J.N. ; Wu, Y.H. 
11Apr-2002Suppression of nitridation-induced interface traps and hole mobility degradation by nitrogen plasma nitridationAng, C.H.; Tan, S.S.; Lek, C.M.; Lin, W.; Zheng, Z.J.; Chen, T.; Cho, B.J. 
124-Nov-2002Thermal stability of (HfO2)x(Al2O 3)1-x on SiYu, H.Y. ; Wu, N.; Li, M.F. ; Zhu, C. ; Cho, B.J. ; Kwong, D.-L.; Tung, C.H.; Pan, J.S.; Chai, J.W.; Wang, W.D.; Chi, D.Z.; Ang, C.H.; Zheng, J.Z.; Ramanathan, S.