Kang Jinfeng

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Full Name

Kang Jinfeng

(not current staff)

Variants

Kang, J.F.
Kang, J.

Main Affiliation

ELECTRICAL AND COMPUTER ENGINEERING

Faculty

FAC OF ENGINEERING

elekjf@nus.edu.sg

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	Issue Date	Title	Author(s)
1	May-2004	Fermi pinning-induced thermal instability of metal-gate work functions	Yu, H.Y. ; Ren, C.; Yeo, Y.-C. ; Kang, J.F. ; Wang, X.P.; Ma, H.H.H. ; Li, M.-F. ; Chan, D.S.H. ; Kwong, D.-L.
2	Mar-2004	Fermi-Level Pinning Induced Thermal Instability in the Effective Work Function of TaN in TaN/SiO 2 Gate Stack	Ren, C.; Yu, H.Y. ; Kang, J.F. ; Hou, Y.T. ; Li, M.-F. ; Wang, W.D.; Chan, D.S.H. ; Kwong, D.-L.
3	Feb-2004	Robust High-Quality HfN-HfO 2 Gate Stack for Advanced MOS Device Applications	Yu, H.Y. ; Kang, J.F. ; Ren, C.; Chen, J.D. ; Hou, Y.T. ; Shen, C.; Li, M.F. ; Chan, D.S.H. ; Bera, K.L.; Tung, C.H.; Kwong, D.-L.
4	2004	Selected topics on HfO 2 gate dielectrics for future ULSI CMOS devices	Li, M.F. ; Yu, H.Y. ; Hou, Y.T. ; Kang, J.F. ; Wang, X.P.; Shen, C.; Ren, C.; Yeo, Y.C. ; Zhu, C.X. ; Chan, D.S.H. ; Chin, A.; Kwong, D.L.
5	15-Jun-2004	SIMS study on N diffusion in hafnium oxynitride	Gui, D.; Kang, J. ; Yu, H. ; Lim, H.F.
6	1-Mar-2004	Thermal stability of nitrogen incorporated in HfN xO y gate dielectrics prepared by reactive sputtering	Kang, J.F. ; Yu, H.Y. ; Ren, C.; Li, M.-F. ; Chan, D.S.H. ; Hu, H.; Lim, H.F. ; Wang, W.D.; Gui, D.; Kwong, D.-L.
7	2003	Thermally Robust High Quality HfN/HfO 2 Gate Stack for Advanced CMOS Devices	Yu, H.Y. ; Kang, J.F. ; Chen, J.D. ; Ren, C.; Hou, Y.T. ; Whang, S.J. ; Li, M.-F. ; Chan, D.S.H. ; Bera, K.L.; Tung, C.H.; Du, A.; Kwong, D.-L.