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Choi, W.K.

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Full Name
Choi, W.K.
Variants
Choi, W.-K.
Choi Wee Kion
Choi, Wee kiong
Choi, W.K
Choi, W.
Choi Wee Kiong
Choi, W.K.
 
Main Affiliation
 
Faculty
 
Email
elechoi@nus.edu.sg
 

Publications

Refined By:
Date Issued:  [2000 TO 2009]
Type:  Conference Paper
Department:  ELECTRICAL & COMPUTER ENGINEERING

Results 1-20 of 36 (Search time: 0.004 seconds).

Issue DateTitleAuthor(s)
12009Arrayed Si/SiGe nanowire heterostructure formation via Au-catalyzed wet chemical etching methodWang, X.; Pey, K.L.; Choi, W.K. ; Ho, C.K.F.; Fitzgerald, E.; Antoniadis, D.
220-Nov-2002C-V and DLTS characterization of rapid thermal oxides on Si0.887Ge0.113 and Si0.8811Ge0.113C0.0059 alloysFeng, W.; Choi, W.K. ; Bera, L.K. ; Mi, J.; Yang, C.Y.
3Jul-2003Characteristics and mechanism of inductive coupled plasma etching of hydrogenated amorphous silicon carbide filmsChoi, W.K. ; Shi, J. ; Chor, E.F. 
4Feb-2009Comparison of the synthesis of Ge nanocrystals in hafnium aluminum oxide and silicon oxide matricesChew, H.G.; Zheng, F.; Choi, W.K. ; Chim, W.K. ; Fitzgerald, E.A.; Foo, Y.L.
52004Confinement of nanocrystals and possible charge storage mechanism for MIS memory devices with ge nanocrystals embedded in SiO 2Ho, V.; Choi, W.K. ; Chim, W.K. ; Teo, L.W.; Du, A.Y.; Tung, C.H.
62003Effect of current distribution on the reliability of multi-terminal Cu dual-damascene interconnect treesGan, C.L.; Thompson, C.V.; Pey, K.L.; Choi, W.K. ; Chang, C.W.; Guo, Q.
7Apr-2003Effects of rapid thermal annealing time and ambient temperature on the charge storage capability of SiO2/pure Ge/rapid thermal oxide memory structureHeng, C.L.; Teo, L.W.; Ho, V.; Tay, M.S.; Lei, Y.; Choi, W.K. ; Chim, W.K. 
8Apr-2003Electrical characterization of a trilayer germanium nanocrystal memory deviceHo, V.; Tay, M.S.; Moey, C.H.; Teo, L.W.; Choi, W.K. ; Chim, W.K. ; Heng, C.L.; Lei, Y.
910-May-2006Electrical characterization of platinum and palladium effects in nickel monosilicide/n-Si Schottky contactsJin, L.J.; Pey, K.L.; Choi, W.K. ; Antoniadis, D.A.; Fitzgerald, E.A.; Chi, D.Z.
102002Experimental characterization of the reliability of 3-terminal dual-damascene copper interconnect treesGan, C.L.; Thompson, C.V.; Pey, K.L. ; Choi, W.K. ; Wei, F.; Yu, B.; Hau-Riege, S.P.
112003Experimental characterization of the reliability of multi-terminal dual-damascene copper interconnect treesGan, C.L.; Thompson, C.V.; Pey, K.L.; Choi, W.K. ; Chang, C.W.; Guo, Q.
12Aug-2006Fabrication of germanium nanowires by oblique angle depositionChew, H.G.; Choi, W.K. ; Chim, W.K.; Fitzgerald, E.A.
132001Factors affecting Ge nanocrystal size in co-sputtered Ge+SiO2 filmsChoi, W.K. ; Ng, V. ; Ho, Y.W.; Chen, T.B.; Ho, V.
142-Feb-2006Formation of germanium nanocrystals in thick silicon oxide matrix on silicon substrate under rapid thermal annealingChoi, W.K. ; Chew, H.G.; Ho, V.; Ng, V. ; Chim, W.K. ; Ho, Y.W.; Ng, S.P.
152007Full range workfunction tunning of MOSFETs using interfacial yttrium layer in fully germanided Ni gateYu, H.P.; Pey, K.L.; Choi, W.K. ; Antoniadis, D.A.; Fitzgerald, E.A.; Dawood, M.K.; Ow, K.Q.; Chi, D.Z.
162004High-K HfAlO charge trapping layer in SONOS-type nonvolatile memory device for high speed operationTan, Y.N.; Chim, W.K. ; Choi, W.K. ; Joo, M.S. ; Ng, T.H.; Cho, B.J. 
1720-Nov-2002ICP etching and structure study of PECVD SiC filmsShi, J. ; Choi, W.K. ; Chor, E.F. 
1820-Mar-2002ICP etching of RF sputtered and PECVD silicon carbide filmsShi, J. ; Chor, E.F. ; Choi, W.K. 
192008Investigation of effect of germanium on the crystallization process of hafnium aluminum oxide matrixZheng, F.; Choi, W.K. ; Chew, H.G.; Chan, L.
2020-Mar-2002Investigation on oxide growth mechanism of PECVD silicon carbide filmsChoi, W.K. ; Leoy, C.C.; Lee, L.P.