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Choi, W.K.

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Full Name
Choi, W.K.
Variants
Choi, W.-K.
Choi Wee Kion
Choi, Wee kiong
Choi, W.K
Choi, W.
Choi Wee Kiong
Choi, W.K.
 
Main Affiliation
 
Faculty
 
Email
elechoi@nus.edu.sg
 

Publications

Refined By:
Date Issued:  [2000 TO 2009]
Department:  PHYSICS
Date Issued:  2002

Results 1-9 of 9 (Search time: 0.004 seconds).

Issue DateTitleAuthor(s)
12002Experimental characterization of the reliability of 3-terminal dual-damascene copper interconnect treesGan, C.L.; Thompson, C.V.; Pey, K.L. ; Choi, W.K. ; Wei, F.; Yu, B.; Hau-Riege, S.P.
21-Jul-2002Interfacial reactions of Ni on Si 1-xGe x (x=0.2,0.3) at low temperature by rapid thermal annealingZhao, H.B.; Pey, K.L. ; Choi, W.K. ; Chattopadhyay, S.; Fitzgerald, E.A.; Antoniadis, D.A.; Lee, P.S.
32002Length effects on the reliability of dual-damascene Cu interconnectsWei, F.; Gan, C.L.; Thompson, C.V.; Clement, J.J.; Hau-Riege, S.P.; Pey, K.L. ; Choi, W.K. ; Tay, H.L.; Yu, B.; Radhakrishnan, M.K.
41-Jan-2002Microstructural characterization of rf sputtered polycrystalline silicon germanium filmsChoi, W.K. ; Teh, L.K.; Bera, L.K. ; Chim, W.K. ; Wee, A.T.S. ; Jie, Y.X. 
520-Nov-2002Nickel silicidation on polycrystalline silicon germanium filmsChoi, W.K. ; Pey, K.L. ; Zhao, H.B.; Osipowicz, T. ; Shen, Z.X. 
620-Nov-2002Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium filmsLeoy, C.C.; Kan, E.W.H.; Arianto, J.; Choi, W.K. ; Wee, A.T.S. ; Liu, Y.J. 
715-Feb-2002Rapid thermal oxidation of radio frequency sputtered polycrystalline silicon germanium filmsChoi, W.K. ; Natarajan, A.; Bera, L.K. ; Wee, A.T.S. ; Liu, Y.J. 
8Nov-2002Thermal reaction of nickel and Si0.75Ge0.25 alloyPey, K.L. ; Choi, W.K. ; Chattopadhyay, S.; Zhao, H.B.; Fitzgerald, E.A.; Antoniadis, D.A.; Lee, P.S.
92002X-ray diffraction and Raman studies of rf sputtered polycrystalline silicon germanium filmsLeoy, C.C.; Choi, W.K. ; Wong, K.L. ; Wong, K.M. ; Osipowicz, T. ; Rong, J.