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Ee Beng, Arthur Tay

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Full Name
Ee Beng, Arthur Tay
Variants
Tay, Arthur
Tay, A.
Tay, E.B.
 
Main Affiliation
 
Faculty
 
Email
eletaya@nus.edu.sg
 

Publications

Results 41-60 of 112 (Search time: 0.005 seconds).

Issue DateTitleAuthor(s)
41Jul-2005Estimation of wafer warpage profile during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.; Chen, X.
422009Evolving computer chinese chess using guided learningQuek, H.Y.; Chan, H.H.; Tan, K.C. ; Tay, A. 
43Mar-2009Evolving Nash-optimal poker strategies using evolutionary computationQuek, H.; Woo, C.; Tan, K. ; Tay, A. 
442012Fast optical proximity correction with timing optimization ready standard cellsQu, Y.; Heng, C.H. ; Tay, A. ; Lee, T.H. 
52004Fault detection and estimation of wafer warpage profile during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.; Zhou, Y.
62010Feedback control applied to improve convergence of performance-based optical proximity correction in advanced lithographyQu, Y.; Tay, A. ; Lee, T.H. 
7Aug-2004In situ fault detection of wafer warpage in microlithographyHo, W.K. ; Tay, A. ; Zhou, Y.; Yang, K.
81-Nov-2006In situ measurement of wafer temperature using two sensors with different dynamical propertiesTan, W.W. ; Tang, J.C.; Loh, A.P. ; Tay, A. 
9Dec-2009In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithographyTay, A. ; Ho, W.K. ; Wu, X.; Chen, X.
102012In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometryNgo, Y.S.; Qu, Y.; Tay, A. ; Lee, T.H. 
112005In-situ fault detection of wafer warpage in lithographyTay, A. ; Ho, W.K. ; Yap, C. ; Wei, C.; Tsai, K.-Y.
122005In-situ measurement & control of photoresist development in microlithographyKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Zhou, Y.
132004In-situ measurement and control for photoresist processing in microlithographyTay, A. ; Ho, W.-K. ; Wu, X.; Kiew, C.-M.
142009In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequenceWu, X.; Yang, G.; Lim, E.-X.; Tay, A. 
152007In-situ monitoring of photoresist thickness contourHo, W.K. ; Wu, X.; Tay, A. ; Chen, X.
162008In-situ real-time temperature control of baking systems in lithographyWang, Y.; Chua, H.-T.; Tay, A. 
172007Influence of wafer warpage on photoresist film thickness and extinction coefficient measurementsWu, X.; Tay, A. 
18May-2004Integrated bake/chill module with in situ temperature measurement for photoresist processingTay, A. ; Ho, W.-K. ; Loh, A.-P. ; Lim, K.-W. ; Tan, W.-W. ; Schaper, C.D.
192009Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processingChua, H.T.; Tay, A. ; Wang, Y.
202005Integrated metrology and processes for semiconductor manufacturingHo, W.K. ; Tay, A. ; Lim, K.W.; Loh, A.P. ; Tan, W.W.