1. ScholarBank@NUS

Ee Beng, Arthur Tay

rp04194

Collaboration Map View Statistics Email Alert RSS Feed

Profile

Full Name
Ee Beng, Arthur Tay
Variants
Tay, Arthur
Tay, A.
Tay, E.B.
 
Main Affiliation
 
Faculty
 
Email
eletaya@nus.edu.sg
 

Publications

Refined By:
Author:  Tay, A.

Results 41-60 of 118 (Search time: 0.007 seconds).

Issue DateTitleAuthor(s)
41Jul-2005Estimation of wafer warpage profile during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.; Chen, X.
422009Evolving computer chinese chess using guided learningQuek, H.Y.; Chan, H.H.; Tan, K.C. ; Tay, A. 
43Mar-2009Evolving Nash-optimal poker strategies using evolutionary computationQuek, H.; Woo, C.; Tan, K. ; Tay, A. 
442012Fast optical proximity correction with timing optimization ready standard cellsQu, Y.; Heng, C.H. ; Tay, A. ; Lee, T.H. 
452004Fault detection and estimation of wafer warpage profile during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.; Zhou, Y.
462010Feedback control applied to improve convergence of performance-based optical proximity correction in advanced lithographyQu, Y.; Tay, A. ; Lee, T.H. 
47Aug-2004In situ fault detection of wafer warpage in microlithographyHo, W.K. ; Tay, A. ; Zhou, Y.; Yang, K.
481-Nov-2006In situ measurement of wafer temperature using two sensors with different dynamical propertiesTan, W.W. ; Tang, J.C.; Loh, A.P. ; Tay, A. 
49Dec-2009In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithographyTay, A. ; Ho, W.K. ; Wu, X.; Chen, X.
102012In-situ critical dimension control during post-exposure bake with spectroscopic ellipsometryNgo, Y.S.; Qu, Y.; Tay, A. ; Lee, T.H. 
112005In-situ fault detection of wafer warpage in lithographyTay, A. ; Ho, W.K. ; Yap, C. ; Wei, C.; Tsai, K.-Y.
122005In-situ measurement & control of photoresist development in microlithographyKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Zhou, Y.
132004In-situ measurement and control for photoresist processing in microlithographyTay, A. ; Ho, W.-K. ; Wu, X.; Kiew, C.-M.
142009In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequenceWu, X.; Yang, G.; Lim, E.-X.; Tay, A. 
152007In-situ monitoring of photoresist thickness contourHo, W.K. ; Wu, X.; Tay, A. ; Chen, X.
162008In-situ real-time temperature control of baking systems in lithographyWang, Y.; Chua, H.-T.; Tay, A. 
172007Influence of wafer warpage on photoresist film thickness and extinction coefficient measurementsWu, X.; Tay, A. 
18May-2004Integrated bake/chill module with in situ temperature measurement for photoresist processingTay, A. ; Ho, W.-K. ; Loh, A.-P. ; Lim, K.-W. ; Tan, W.-W. ; Schaper, C.D.
192009Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processingChua, H.T.; Tay, A. ; Wang, Y.
202005Integrated metrology and processes for semiconductor manufacturingHo, W.K. ; Tay, A. ; Lim, K.W.; Loh, A.P. ; Tan, W.W.