Full Name
Cho Byung-Jin
(not current staff)
Variants
Cho, Byung Jin
CHO, BYUNG JIN
Cho, B.
Cho, B.J.
Cho, B.C.
Cho, Byung-Jin
Byung, J.C.
Cho, B.-J.
 
 
 
Email
elebjcho@nus.edu.sg
 

Refined By:
Author:  Cho, B.J.

Results 141-151 of 151 (Search time: 0.006 seconds).

Issue DateTitleAuthor(s)
141Nov-2004Thermal instability of effective work function in metal/high-κ stack and its material dependenceJoo, M.S. ; Cho, B.J. ; Balasubramanian, N.; Kwong, D.-L.
142Nov-2004Thermal instability of effective work function in metal/high-κ stack and its material dependenceJoo, M.S. ; Cho, B.J. ; Balasubramanian, N.; Kwong, D.-L.
1434-Nov-2002Thermal stability of (HfO2)x(Al2O 3)1-x on SiYu, H.Y. ; Wu, N.; Li, M.F. ; Zhu, C. ; Cho, B.J. ; Kwong, D.-L.; Tung, C.H.; Pan, J.S.; Chai, J.W.; Wang, W.D.; Chi, D.Z.; Ang, C.H.; Zheng, J.Z.; Ramanathan, S.
1441-May-2006Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectricYeo, C.C.; Cho, B.J. ; Lee, M.H.; Liu, C.W.; Choi, K.J.; Lee, T.W.
1452006Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si1-xGex/Si nMOSFETs with HfO2gate dielectricYeo, C.C. ; Cho, B.J. ; Lee, M.H.; Liu, C.W.; Choi, K.J.; Lee, T.W.
1467-Dec-2006Thermally stable fully silicided Hf silicide metal gate electrodePARK, CHANG SEO ; CHO, BYUNG JIN 
147Jun-2004Thermally stable fully silicided Hf-silicide metal-gate electrodePark, C.S. ; Cho, B.J. ; Kwong, D.-L.
148Oct-2003Very high density RF MIM capacitors (17 fF/μm2) using high-κ Al2O3 doped Ta2O5 dielectricsYang, M.Y.; Huang, C.H.; Chin, A.; Zhu, C. ; Cho, B.J. ; Li, M.F. ; Kwong, D.-L.
1492003Very Low Defects and High Performance Ge-On-insulator p-MOSFETs with Al2O3 Gate DielectricsHuang, C.H.; Yang, M.Y.; Chin, A.; Chen, W.J.; Zhu, C.X. ; Cho, B.J. ; Li, M.-F. ; Kwong, D.L.
1502003Voltage and Temperature Dependence of Capacitance of High-K HfO 2 MIM Capacitors: A Unified Understanding and PredictionZhu, C. ; Hu, H.; Yu, X.; Kim, S.J. ; Chin, A.; Li, M.F. ; Cho, B.J. ; Kwong, D.L.
151Sep-2004Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO2 filmBalasubramanian, M.; Bera, L.K. ; Mathew, S.; Balasubramanian, N. ; Lim, V.; Joo, M.S. ; Cho, B.J.