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Armin Gerhard Aberle

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Full Name
Armin Gerhard Aberle
Variants
Aberle, Armin Gerhard
Aberle, A.
Aberle, Aarmin Gerhard
Aberle, A.G.
 
Main Affiliation
 
Faculty
 
Email
seraag@nus.edu.sg
 
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Publications

Refined By:
Author:  Hoex, B.
Department:  SOLAR ENERGY RESEARCH INST OF S'PORE
Date Issued:  2013

Results 1-14 of 14 (Search time: 0.005 seconds).

Issue DateTitleAuthor(s)
131-Oct-2013Accurate characterization of thin films on rough surfaces by spectroscopic ellipsometrySiah, S.C.; Hoex, B. ; Aberle, A.G. 
22013Advanced solar cell modellingPeters, M.; Fajun, M. ; Cangming, K.; Siyu, G.; Sahraei, N.; Hoex, B. ; Aberle, A.G. 
37-Sep-2013Deposition temperature independent excellent passivation of highly boron doped silicon emitters by thermal atomic layer deposited Al2O 3Liao, B.; Stangl, R.; Ma, F. ; Hameiri, Z.; Mueller, T.; Chi, D.; Aberle, A.G. ; Bhatia, C.S. ; Hoex, B. 
4Jun-2013Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactorDuttagupta, S.; Lin, F. ; Shetty, K.D.; Aberle, A.G. ; Hoex, B. 
525-Sep-2013Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activationLiao, B.; Stangl, R.; Ma, F. ; Mueller, T.; Lin, F. ; Aberle, A.G. ; Bhatia, C.S. ; Hoex, B. 
623-Dec-2013Extracting physical properties of arbitrarily shaped laser-doped micro-scale areas in semiconductorsHeinrich, M.; Kluska, S.; Hameiri, Z.; Hoex, B. ; Aberle, A.G. 
72013Extremely low surface recombination velocities on heavily doped planar and textured p+ silicon using low-temperature positively-charged PECVD SiOx/SiNx dielectric stacks with optimised antireflective propertiesDuttagupta, S.; Ma, F.-J.; Hoex, B. ; Aberle, A.G. 
87-Jun-2013Integration of β-FeSi2 with poly-Si on glass for thin-film photovoltaic applicationsKumar, A.; Dalapati, G.K.; Hidayat, H.; Law, F.; Tan, H.R.; Widenborg, P.I. ; Hoex, B. ; Tan, C.C.; Chi, D.Z.; Aberle, A.G. 
92013Investigation of screen-printed rear contacts for aluminum local back surface field silicon wafer solar cellsChen, J.; Tey, Z.H.J.; Du, Z.R.; Lin, F. ; Hoex, B. ; Aberle, A.G. 
102013Laser chemical processing (LCP) of poly-silicon thin film on glass substratesVirasawmy, S. ; Palina, N.; Chakraborty, S.; Widenborg, P.I. ; Hoex, B. ; Aberle, A.G. 
112013Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide filmsLin, F. ; Hoex, B. ; Koh, Y.H.; Lin, J. ; Aberle, A.G. 
122013Numerical modelling of silicon p+ emitters passivated by a PECVD AlOx/SiNx stackMa, F.-J.; Duttagupta, S.; Peters, M.; Samudra, G.S. ; Aberle, A.G. ; Hoex, B. 
132013Progress in surface passivation of heavily doped n-type and p-type silicon by plasma-deposited AlO x/SiNx dielectric stacksDuttagupta, S.; Ma, F.-J. ; Lin, S.F.; Mueller, T.; Aberle, A.G. ; Hoex, B. 
142013Unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acidLiu, L.; Lin, F. ; Heinrich, M.; Aberle, A.G. ; Hoex, B.