Full Name
Fen Lin
Variants
Lin, Fen
Lin, F.
 
 
 
Email
serlf@nus.edu.sg
 

Publications

Refined By:
Date Issued:  [2010 TO 2019]
Department:  ELECTRICAL & COMPUTER ENGINEERING

Results 1-12 of 12 (Search time: 0.004 seconds).

Issue DateTitleAuthor(s)
12015Accurate extraction of the series resistance of aluminum local back surface field silicon wafer solar cellsChen, Jia; Du, Zheren ; Ma, Fajun ; Lin, Fen ; Sarangi, Debajyoti ; Hoex, Bram ; Aberle, Armin Gerhard 
22012Aluminum local back surface field solar cells with inkjet-opened rear dielectric filmsLiu, L.; Du, Z.; Lin, F. ; Hoex, B. ; Aberle, A.G. 
3Jun-2013Excellent boron emitter passivation for high-efficiency Si wafer solar cells using AlOx/SiNx dielectric stacks deposited in an industrial inline plasma reactorDuttagupta, S.; Lin, F. ; Shetty, K.D.; Aberle, A.G. ; Hoex, B. 
425-Sep-2013Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activationLiao, B.; Stangl, R.; Ma, F. ; Mueller, T.; Lin, F. ; Aberle, A.G. ; Bhatia, C.S. ; Hoex, B. 
5Oct-2012Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacksLin, F. ; Duttagupta, S.; Shetty, K.D.; Boreland, M.; Aberle, A.G. ; Hoex, B. 
62011High-quality surface passivation of low-resistivity p-type C-Si by hydrogenated amorphous silicon nitride deposited by industrial-scale microwave PECVDDutta Gupta, S.; Hoex, B. ; Lin, F. ; Mueller, T.; Aberle, A.G. 
72013Investigation of screen-printed rear contacts for aluminum local back surface field silicon wafer solar cellsChen, J.; Tey, Z.H.J.; Du, Z.R.; Lin, F. ; Hoex, B. ; Aberle, A.G. 
82013Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide filmsLin, F. ; Hoex, B. ; Koh, Y.H.; Lin, J. ; Aberle, A.G. 
92012Low-temperature surface passivation of moderately doped crystalline silicon by atomic-layer-deposited hafnium oxide filmsLin, F. ; Hoex, B. ; Koh, Y.H.; Lin, J.J. ; Aberle, A.G. 
102012State-of-the-art surface passivation of boron emitters using inline PECVD AlOx/SiNx stacks for industrial high-efficiency silicon wafer solar cellsDuttagupta, S.; Lin, F. ; Shetty, K.D.; Wilson, M.; Ma, F.-J. ; Lin, J. ; Aberle, A.G. ; Hoex, B. 
1114-Jan-2013The effect of light soaking on crystalline silicon surface passivation by atomic layer deposited Al2O3Liao, B.; Stangl, R.; Mueller, T.; Lin, F. ; Bhatia, C.S. ; Hoex, B. 
122013Unexpectedly high etching rate of highly doped n-type crystalline silicon in hydrofluoric acidLiu, L.; Lin, F. ; Heinrich, M.; Aberle, A.G. ; Hoex, B.