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Weng Khuen Ho

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Full Name
Weng Khuen Ho
Variants
Ho, W.-K.
Ho, Weng-Khuen
Khuen, Ho Weng
Ho, M.
Ho, Weng Khuen
Khuen Ho, W.
Ho, W.Y.
Khuen, H.W.
Ho, W.K.
 
Main Affiliation
 
Faculty
 
Email
elehowk@nus.edu.sg
 

Publications

Refined By:
Department:  ELECTRICAL AND COMPUTER ENGINEERING
Author:  Tay, A.

Results 1-20 of 54 (Search time: 0.007 seconds).

Issue DateTitleAuthor(s)
12004A novel wafer baking system using hot air streamsLan, W.; Loong, C.S.; Poh, L.A. ; Ming, G.Z.; Wan, T.W. ; Tay, A. ; Khuen, H.W. 
22004A Robust Strategy for Joint Data Reconciliation and Parameter EstimationJoe, Y.Y.; Wang, D.; Ching, C.B.; Tay, A. ; Ho, W.K. ; Romagnoli, J.
3Feb-2007An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.
42008CD uniformity control via real-time control of photoresist propertiesChen, M.; Fu, J. ; Ho, W.K. ; Tay, A. 
5Feb-2005Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal arraySchaper, C.D.; El-Awady, K.; Kailath, T.; Tay, A. ; Lee, L.L.; Ho, W.K. ; Fuller, S.E.
6Feb-2004Constraint feedforward control for thermal processing of quartz photomasks in microelectronics manufacturingTay, A. ; Ho, W.K. ; Schaper, C.D.; Lee, L.L.
72002Control and signal processing for photoresist processing in microlithographyTay, A. ; Ho, W.K. ; Lim, K.W. ; Loh, A.P. ; Tan, W.W. 
815-Jan-2006Control of photoresist film thickness: Iterative feedback tuning approachTay, A. ; Khuen Ho, W. ; Deng, J.; Keng Lok, B.
9Dec-2008Critical dimension and real-time temperature control for warped wafersHo, W.K. ; Tay, A. ; Fu, J. ; Chen, M.; Feng, Y.
10Nov-2007Critical dimension uniformity via real-time photoresist thickness controlHo, W.K. ; Tay, A. ; Chen, M.; Fu, J. ; Lu, H.; Shan, X.
112004Detection of Wafer warpages during thermal processing in microlithographyHo, W.K. ; Tay, A. ; Zhou, Y.; Yang, K.; Hu, N.
122012Development of in-situ real-time CD monitoring and control system through PEB processYang, G.; Tay, A. ; Ho, W.K. 
13Jul-2005Estimation of wafer warpage profile during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.; Chen, X.
142004Fault detection and estimation of wafer warpage profile during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.; Zhou, Y.
15Aug-2004In situ fault detection of wafer warpage in microlithographyHo, W.K. ; Tay, A. ; Zhou, Y.; Yang, K.
16Dec-2009In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithographyTay, A. ; Ho, W.K. ; Wu, X.; Chen, X.
172005In-situ fault detection of wafer warpage in lithographyTay, A. ; Ho, W.K. ; Yap, C. ; Wei, C.; Tsai, K.-Y.
182005In-situ measurement & control of photoresist development in microlithographyKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Zhou, Y.
192004In-situ measurement and control for photoresist processing in microlithographyTay, A. ; Ho, W.-K. ; Wu, X.; Kiew, C.-M.
202007In-situ monitoring of photoresist thickness contourHo, W.K. ; Wu, X.; Tay, A. ; Chen, X.