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Ee Beng, Arthur Tay

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Full Name
Ee Beng, Arthur Tay
Variants
Tay, Arthur
Tay, A.
Tay, E.B.
 
Main Affiliation
 
Faculty
 
Email
eletaya@nus.edu.sg
 

Publications

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Author:  Tay, A.
Date Issued:  [2000 TO 2009]
Date Issued:  2007

Results 1-16 of 16 (Search time: 0.004 seconds).

Issue DateTitleAuthor(s)
12007A cooperative coevolutionary algorithm for multiobjective particle swarm optimizationTan, C.H.; Goh, C.K.; Tan, K.C. ; Tay, A. 
2Feb-2007A lamp thermoelectricity based integrated bake/chill system for photoresist processingTay, A. ; Chua, H.T.; Wu, X.
3Feb-2007An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.
4Nov-2007Critical dimension uniformity via real-time photoresist thickness controlHo, W.K. ; Tay, A. ; Chen, M.; Fu, J. ; Lu, H.; Shan, X.
52007Discovering Chinese chess strategies through coevolutionary approachesOng, C.S.; Quek, H.Y.; Tan, K.C. ; Tay, A. 
6Jan-2007Disturbance compensation incorporated in predictive control system using a repetitive learning approachTan, K.K. ; Huang, S.N. ; Lee, T.H. ; Tay, A. 
7Sep-2007Dynamic modeling and adaptive control of a H-type gantry stageTeo, C.S.; Tan, K.K. ; Lim, S.Y. ; Huang, S. ; Tay, E.B. 
82007Equipment design and control of advanced thermal processing system in lithographyTay, A. ; Wang, Y.; Chua, H.T.
92007In-situ monitoring of photoresist thickness contourHo, W.K. ; Wu, X.; Tay, A. ; Chen, X.
102007Influence of wafer warpage on photoresist film thickness and extinction coefficient measurementsWu, X.; Tay, A. 
1123-May-2007Optimal feed-forward control for multizone baking in microlithographyHo, W.K. ; Tay, A. ; Chen, M.; Kiew, C.M.
122007Piezo-assisted intra-cytoplasmic sperm injection: A comparative study of two penetration techniquesPutra, A.S. ; Huang, S. ; Tan, K.K. ; Panda, S.K. ; Lee, T.H. ; Tay, A. ; Ng, S.C. 
13Jan-2007Real-time control of photoresist extinction coefficient uniformity in the microlithography processTay, A. ; Ho, W.K. ; Wu, X.
142007Real-time estimation and control of photoresist properties in microlithographyWu, X.; Tay, A. ; Ho, W.K. ; Tan, K.K. 
152007Real-time spatial control of photoresist development rateTay, A. ; Ho, W.-K. ; Hu, N.; Kiew, C.-M.; Tsai, K.-Y.
16Feb-2007Temperature control and in situ fault detection of wafer warpageHo, W.K. ; Yap, C. ; Tay, A. ; Chen, W.; Zhou, Y.; Tan, W.W. ; Chen, M.