Please use this identifier to cite or link to this item: https://doi.org/10.1021/ie061011p
Title: Optimal feed-forward control for multizone baking in microlithography
Authors: Ho, W.K. 
Tay, A. 
Chen, M.
Kiew, C.M.
Issue Date: 23-May-2007
Citation: Ho, W.K., Tay, A., Chen, M., Kiew, C.M. (2007-05-23). Optimal feed-forward control for multizone baking in microlithography. Industrial and Engineering Chemistry Research 46 (11) : 3623-3628. ScholarBank@NUS Repository. https://doi.org/10.1021/ie061011p
Abstract: An algorithm for feed-forward control to improve the performance of a multizone baking system used for lithography in semiconductor manufacturing is derived in this paper. It uses linear programming optimization of the heat transfer in a multizone bake plate to produce a predetermined heating sequence. The objective is to minimize the temperature disturbance induced by the placement of a wafer at ambient temperature on the hot multizone bake plate, and the improvement is verified experimentally. © 2007 American Chemical Society.
Source Title: Industrial and Engineering Chemistry Research
URI: http://scholarbank.nus.edu.sg/handle/10635/56934
ISSN: 08885885
DOI: 10.1021/ie061011p
Appears in Collections:Staff Publications

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