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|Title:||Optimal feed-forward control for multizone baking in microlithography||Authors:||Ho, W.K.
|Issue Date:||23-May-2007||Citation:||Ho, W.K., Tay, A., Chen, M., Kiew, C.M. (2007-05-23). Optimal feed-forward control for multizone baking in microlithography. Industrial and Engineering Chemistry Research 46 (11) : 3623-3628. ScholarBank@NUS Repository. https://doi.org/10.1021/ie061011p||Abstract:||An algorithm for feed-forward control to improve the performance of a multizone baking system used for lithography in semiconductor manufacturing is derived in this paper. It uses linear programming optimization of the heat transfer in a multizone bake plate to produce a predetermined heating sequence. The objective is to minimize the temperature disturbance induced by the placement of a wafer at ambient temperature on the hot multizone bake plate, and the improvement is verified experimentally. © 2007 American Chemical Society.||Source Title:||Industrial and Engineering Chemistry Research||URI:||http://scholarbank.nus.edu.sg/handle/10635/56934||ISSN:||08885885||DOI:||10.1021/ie061011p|
|Appears in Collections:||Staff Publications|
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