Full Name
Choi, W.K.
Variants
Choi, W.-K.
Choi Wee Kion
Choi, Wee kiong
Choi, W.K
Choi, W.
Choi Wee Kiong
Choi, W.K.
 
 
Email
elechoi@nus.edu.sg
 

Publications

Refined By:
Date Issued:  [2000 TO 2009]
Author:  Chim, W.K.

Results 1-20 of 38 (Search time: 0.004 seconds).

Issue DateTitleAuthor(s)
12004A MONOS-type flash memory using a high-k HfAlO charge trapping layerTan, Y.N.; Chim, W.K. ; Cho, B.J. ; Choi, W.K. 
220-Sep-2004Clarifying the origin of near-infrared electroluminescence peaks for nanocrystalline germanium in metal-insulator-silicon structuresKan, E.W.H.; Chim, W.K. ; Lee, C.H.; Choi, W.K. ; Ng, T.H.
3Feb-2009Comparison of the synthesis of Ge nanocrystals in hafnium aluminum oxide and silicon oxide matricesChew, H.G.; Zheng, F.; Choi, W.K. ; Chim, W.K. ; Fitzgerald, E.A.; Foo, Y.L.
42006Conductance-voltage measurements on germanium nanocrystal memory structures and effect of gate electric field couplingNg, T.H.; Chim, W.K. ; Choi, W.K. 
52004Confinement of nanocrystals and possible charge storage mechanism for MIS memory devices with ge nanocrystals embedded in SiO 2Ho, V.; Choi, W.K. ; Chim, W.K. ; Teo, L.W.; Du, A.Y.; Tung, C.H.
62004Confinement of nanocrystals and possible charge storage mechanism for MIS memory devices with ge nanocrystals embedded in SiO 2Ho, V.; Choi, W.K. ; Chim, W.K. ; Teo, L.W.; Du, A.Y.; Tung, C.H.
72004Confinement of nanocrystals and possible charge storage mechanism for MIS memory devices with ge nanocrystals embedded in SiO 2Ho, V.; Choi, W.K. ; Chim, W.K. ; Teo, L.W.; Du, A.Y.; Tung, C.H.
88-Sep-2003Effect of annealing profile on defect annihilation, crystallinity and size distribution of germanium nanodots in silicon oxide matrixKan, E.W.H.; Choi, W.K. ; Leoy, C.C.; Chim, W.K. ; Antoniadis, D.A.; Fitzgerald, E.A.
928-Apr-2006Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrixChew, H.G.; Choi, W.K. ; Foo, Y.L.; Zheng, F.; Chim, W.K. ; Voon, Z.J.; Seow, K.C.; Fitzgerald, E.A.; Lai, D.M.Y.
1027-Oct-2003Effect of germanium concentration and tunnel oxide thickness on nanocrystal formation and charge storage/retention characteristics of a trilayer memory structureHo, V.; Teo, L.W.; Choi, W.K. ; Chim, W.K. ; Tay, M.S.; Antoniadis, D.A.; Fitzgerald, E.A.; Du, A.Y.; Tung, C.H.; Liu, R. ; Wee, A.T.S. 
11Apr-2003Effects of rapid thermal annealing time and ambient temperature on the charge storage capability of SiO2/pure Ge/rapid thermal oxide memory structureHeng, C.L.; Teo, L.W.; Ho, V.; Tay, M.S.; Lei, Y.; Choi, W.K. ; Chim, W.K. 
12Apr-2003Electrical characterization of a trilayer germanium nanocrystal memory deviceHo, V.; Tay, M.S.; Moey, C.H.; Teo, L.W.; Choi, W.K. ; Chim, W.K. ; Heng, C.L.; Lei, Y.
13Sep-2004Fabrication and characterization of a trilayer germanium nanocrystal memory device with hafnium dioxide as the tunnel dielectricNg, T.H.; Ho, V.; Teo, L.W.; Tay, M.S.; Koh, B.H.; Chim, W.K. ; Choi, W.K. ; Du, A.Y.; Tung, C.H.
1414-Mar-2007First-principles study of native point defects in hafnia and zirconiaZheng, J.X.; Ceder, G.; Maxisch, T.; Chim, W.K. ; Choi, W.K. 
152-Feb-2006Formation of germanium nanocrystals in thick silicon oxide matrix on silicon substrate under rapid thermal annealingChoi, W.K. ; Chew, H.G.; Ho, V.; Ng, V. ; Chim, W.K. ; Ho, Y.W.; Ng, S.P.
164-Apr-2005Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealingChoi, W.K. ; Ho, V.; Ng, V. ; Ho, Y.W.; Ng, S.P.; Chim, W.K. 
17Apr-2006Hafnium aluminum oxide as charge storage and blocking-oxide layers in SONOS-type nonvolatile memory for high-speed operationTan, Y.N.; Chim, W.K. ; Choi, W.K. ; Joo, M.S. ; Cho, B.J. 
182004High-K HfAlO charge trapping layer in SONOS-type nonvolatile memory device for high speed operationTan, Y.N.; Chim, W.K. ; Choi, W.K. ; Joo, M.S. ; Ng, T.H.; Cho, B.J. 
1914-Feb-2007Influence of reductant and germanium concentration on the growth and stress development of germanium nanocrystals in silicon oxide matrixChew, H.G.; Zheng, F.; Choi, W.K. ; Chim, W.K. ; Foo, Y.L.; Fitzgerald, E.A.
2015-Apr-2003Interfacial and bulk properties of zirconium dioxide as a gate dielectric in metal-insulator-semiconductor structures and current transport mechanismsChim, W.K. ; Ng, T.H.; Koh, B.H.; Choi, W.K. ; Zheng, J.X.; Tung, C.H.; Du, A.Y.