Lee Tek Po,Rinus

Collaboration Map View Statistics Email Alert RSS Feed

Full Name

Lee Tek Po,Rinus

(not current staff)

Variants

Lee, R.T.P.
Lee, R.T.-P.

Main Affiliation

ELECTRICAL AND COMPUTER ENGINEERING

Faculty

FAC OF ENGINEERING

eleltpr@nus.edu.sg

Refined By:

Type: Article

Department: ELECTRICAL AND COMPUTER ENGINEERING

Subject: Metal gate

Results 1-5 of 5 (Search time: 0.009 seconds).

Refman EndNote Bibtex RefWorks Excel CSV PDF Send via email

	Issue Date	Title	Author(s)
1	Sep-2006	Drive-current enhancement in FinFETs using gate-induced stress	Tan, K.-M.; Liow, T.-Y.; Lee, R.T.P. ; Tung, C.-H.; Samudra, G.S. ; Yoo, W.-J. ; Yeo, Y.-C.
2	25-Apr-2008	Effectiveness of aluminum incorporation in nickel silicide and nickel germanide metal gates for work function reduction	Lim, A.E.-J.; Lee, R.T.P. ; Koh, A.T.Y.; Samudra, G.S. ; Kwong, D.-L. ; Yeo, Y.-C.
3	Aug-2008	Modification of molybdenum gate electrode work function via (La-, Al-Induced) dipole effect at High-κ/SiO2 interface	Lim, A.E.-J.; Lee, R.T.P. ; Samudra, G.S. ; Kwong, D.-L.; Yeo, Y.-C.
4	2008	Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates	Lim, A.E.-J.; Lee, R.T.P. ; Samudra, G.S. ; Kwong, D.-L.; Yeo, Y.-C.
5	Jun-2007	Yttrium- and terbium-based interlayer on SiO2 and HfO2 gate dielectrics for work function modulation of nickel fully silicided gate in nMOSFET	Lim, A.E.-J.; Lee, R.T.P. ; Wang, X.P.; Hwang, W.S.; Tung, C.H.; Samudra, G.S. ; Kwong, D.-L.; Yeo, Y.-C.