Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/70633
Title: Integration of tensile-strained Ge p-i-n photodetector on advanced CMOS platform
Authors: Wang, J. 
Loh, W.Y.
Zang, H.
Yu, M.B.
Chua, K.T.
Loh, T.H.
Ye, J.D.
Yang, R.
Wang, X.L.
Lee, S.J. 
Cho, B.J. 
Lo, G.Q.
Kwong, D.L.
Issue Date: 2007
Citation: Wang, J.,Loh, W.Y.,Zang, H.,Yu, M.B.,Chua, K.T.,Loh, T.H.,Ye, J.D.,Yang, R.,Wang, X.L.,Lee, S.J.,Cho, B.J.,Lo, G.Q.,Kwong, D.L. (2007). Integration of tensile-strained Ge p-i-n photodetector on advanced CMOS platform. IEEE International Conference on Group IV Photonics GFP : 52-54. ScholarBank@NUS Repository.
Abstract: Tensile-strained Ge photodetector is realized on Si-substrate using novel Si/SiGe compliant layer with two-step Ge-process. Monolithic integration of p-i-n detectors with low dark current (0.4nA), responsivity (190mA/W) and high speed (>5GHz) on Ge-CMOS platform is demonstrated, with Ge pMOSFET showing 2X Si hole mobility. ©2007 IEEE.
Source Title: IEEE International Conference on Group IV Photonics GFP
URI: http://scholarbank.nus.edu.sg/handle/10635/70633
ISSN: 19492081
Appears in Collections:Staff Publications

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