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https://doi.org/10.1109/66.964325
Title: | Minimum time control of conductive heating systems for microelectronics processing | Authors: | Tay, A. Ho, W.K. Poh, Y.P. |
Keywords: | Lithography Minimum-time control Photoresist Temperature control |
Issue Date: | Nov-2001 | Citation: | Tay, A., Ho, W.K., Poh, Y.P. (2001-11). Minimum time control of conductive heating systems for microelectronics processing. IEEE Transactions on Semiconductor Manufacturing 14 (4) : 381-386. ScholarBank@NUS Repository. https://doi.org/10.1109/66.964325 | Abstract: | A minimum time control scheme is designed to improve repeatability by minimizing the loading effects induced by the common processing condition of placement of a semiconductor wafer at ambient temperature on a large thermal-mass bake plate at processing temperature. The minimum time control strategy provides an optimal solution for minimizing the worst case deviation from a nominal temperature set-point during the load disturbance condition. This results in a predictive controller that performs a predetermined heating sequence prior to the arrival of the wafer as part of the resulting feedforward/feedback strategy to eliminate the load disturbance. The controller is easy to design and implement and makes it more suitable for online implementation such as automatic online tuning of a feedforward controller. Experimental results depict an order-of-magnitude improvement in the settling time and the integral-square temperature error between the optimal predictive controller and a feedback controller for a typical load disturbance. | Source Title: | IEEE Transactions on Semiconductor Manufacturing | URI: | http://scholarbank.nus.edu.sg/handle/10635/56643 | ISSN: | 08946507 | DOI: | 10.1109/66.964325 |
Appears in Collections: | Staff Publications |
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