Please use this identifier to cite or link to this item: https://doi.org/10.1109/66.964325
DC FieldValue
dc.titleMinimum time control of conductive heating systems for microelectronics processing
dc.contributor.authorTay, A.
dc.contributor.authorHo, W.K.
dc.contributor.authorPoh, Y.P.
dc.date.accessioned2014-06-17T02:56:56Z
dc.date.available2014-06-17T02:56:56Z
dc.date.issued2001-11
dc.identifier.citationTay, A., Ho, W.K., Poh, Y.P. (2001-11). Minimum time control of conductive heating systems for microelectronics processing. IEEE Transactions on Semiconductor Manufacturing 14 (4) : 381-386. ScholarBank@NUS Repository. https://doi.org/10.1109/66.964325
dc.identifier.issn08946507
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/56643
dc.description.abstractA minimum time control scheme is designed to improve repeatability by minimizing the loading effects induced by the common processing condition of placement of a semiconductor wafer at ambient temperature on a large thermal-mass bake plate at processing temperature. The minimum time control strategy provides an optimal solution for minimizing the worst case deviation from a nominal temperature set-point during the load disturbance condition. This results in a predictive controller that performs a predetermined heating sequence prior to the arrival of the wafer as part of the resulting feedforward/feedback strategy to eliminate the load disturbance. The controller is easy to design and implement and makes it more suitable for online implementation such as automatic online tuning of a feedforward controller. Experimental results depict an order-of-magnitude improvement in the settling time and the integral-square temperature error between the optimal predictive controller and a feedback controller for a typical load disturbance.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/66.964325
dc.sourceScopus
dc.subjectLithography
dc.subjectMinimum-time control
dc.subjectPhotoresist
dc.subjectTemperature control
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1109/66.964325
dc.description.sourcetitleIEEE Transactions on Semiconductor Manufacturing
dc.description.volume14
dc.description.issue4
dc.description.page381-386
dc.description.codenITSME
dc.identifier.isiut000172231100010
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