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https://scholarbank.nus.edu.sg/handle/10635/34887
| Title: | Low work function metal alloy | Authors: | YU HONGYU JINGDE CHEN MINGFU LI KWONG DIM-LEE BIESEMANS SERGE |
Issue Date: | 13-Jun-2007 | Citation: | YU HONGYU,JINGDE CHEN,MINGFU LI,KWONG DIM-LEE,BIESEMANS SERGE (2007-06-13). Low work function metal alloy. ScholarBank@NUS Repository. | Abstract: | The present invention discloses low work function metals for use as gate electrode in nMOS devices. In particular an alloy of Nickel-Ytterbium (NiYb) is used to fully silicide (FUSI) a silicon gate. The resulting Nickel-Ytterbium-Silicon gate electrode has a work function of about 4.22eV. | URI: | http://scholarbank.nus.edu.sg/handle/10635/34887 |
| Appears in Collections: | Staff Publications |
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| File | Description | Size | Format | Access Settings | Version | |
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| EP1796151A1.pdf | 679.92 kB | Adobe PDF | OPEN | Published | View/Download |
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