Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/34887
Title: Low work function metal alloy
Authors: YU HONGYU
JINGDE CHEN 
MINGFU LI 
KWONG DIM-LEE 
BIESEMANS SERGE
Issue Date: 13-Jun-2007
Source: YU HONGYU,JINGDE CHEN,MINGFU LI,KWONG DIM-LEE,BIESEMANS SERGE (2007-06-13). Low work function metal alloy. ScholarBank@NUS Repository.
Abstract: The present invention discloses low work function metals for use as gate electrode in nMOS devices. In particular an alloy of Nickel-Ytterbium (NiYb) is used to fully silicide (FUSI) a silicon gate. The resulting Nickel-Ytterbium-Silicon gate electrode has a work function of about 4.22eV.
URI: http://scholarbank.nus.edu.sg/handle/10635/34887
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