Please use this identifier to cite or link to this item: https://doi.org/10.1364/OE.27.019815
Title: Thermal annealing study of the mid-infrared aluminum nitride on insulator (AlNOI) photonics platform
Authors: Dong, Bowei 
Luo, Xianshu
Zhu, Shiyang 
Hu, Ting
Li, Mo
Hasan, Dihan 
Zhang, Li 
Chua, Soo Jin 
Wei, Jingxuan 
Chang, Yuhua 
Ma, Yiming 
Vachon, Philippe 
Lo, Guo-Qiang
Ang, Kah Wee 
Kwong, Dim-Lee 
Lee, Chengkuo 
Keywords: Science & Technology
Physical Sciences
Optics
Issue Date: 8-Jul-2019
Publisher: OPTICAL SOC AMER
Citation: Dong, Bowei, Luo, Xianshu, Zhu, Shiyang, Hu, Ting, Li, Mo, Hasan, Dihan, Zhang, Li, Chua, Soo Jin, Wei, Jingxuan, Chang, Yuhua, Ma, Yiming, Vachon, Philippe, Lo, Guo-Qiang, Ang, Kah Wee, Kwong, Dim-Lee, Lee, Chengkuo (2019-07-08). Thermal annealing study of the mid-infrared aluminum nitride on insulator (AlNOI) photonics platform. OPTICS EXPRESS 27 (14) : 19815-19826. ScholarBank@NUS Repository. https://doi.org/10.1364/OE.27.019815
Abstract: Aluminum nitride on insulator (AlNOI) photonics platform has great potential for mid-infrared applications thanks to the large transparency window, piezoelectric property, and second-order nonlinearity of AlN. However, the deployment of AlNOI platform might be hindered by the high propagation loss. We perform thermal annealing study and demonstrate significant loss improvement in the mid-infrared AlNOI photonics platform. After thermal annealing at 400°C for 2 hours in ambient gas environment, the propagation loss is reduced by half. Bend loss and taper coupling loss are also investigated. The performance of multimode interferometer, directional coupler, and add/drop filter are improved in terms of insertion loss, quality factor, and extinction ratio. Fourier-transform infrared spectroscopy, Raman spectroscopy, and X-ray diffraction spectroscopy suggest the loss improvement is mainly attributed to the reduction of extinction coefficient in the silicon dioxide cladding. Apart from loss improvement, appropriate thermal annealing also helps in reducing thin film stress.
Source Title: OPTICS EXPRESS
URI: https://scholarbank.nus.edu.sg/handle/10635/190060
ISSN: 10944087
15394794
DOI: 10.1364/OE.27.019815
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