Chin Feng-Der,Albert

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Full Name

(not current staff)

Variants

Chin, A.

Main Affiliation

ELECTRICAL AND COMPUTER ENGINEERING

Faculty

FAC OF ENGINEERING

elecfa@nus.edu.sg

Refined By:

Author: rp01634

Author: Li, M.-F.

Subject: High-κ dielectric

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		Issue Date	Title	Author(s)
	1	Sep-2005	Metal-insulator-metal RF bypass capacitor using niobium oxide (Nb2O5) with HfO2/Al2O3 barriers	Kim, S.-J. ; Cho, B.J. ; Yu, M.B.; Li, M.-F. ; Xiong, Y.-Z.; Zhu, C. ; Chin, A. ; Kwong, D.-L.
	2	Jan-2006	Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs	Wang, X.P.; Li, M.-F. ; Ren, C.; Yu, X.F.; Shen, C.; Ma, H.H. ; Chin, A. ; Zhu, C.X. ; Ning, J.; Yu, M.B.; Kwong, D.-L.