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Ee Beng, Arthur Tay

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Full Name
Ee Beng, Arthur Tay
Variants
Tay, Arthur
Tay, A.
Tay, E.B.
 
Main Affiliation
 
Faculty
 
Email
eletaya@nus.edu.sg
 

Publications

Results 81-100 of 112 (Search time: 0.006 seconds).

Issue DateTitleAuthor(s)
811996Performance and gain and phase margins of well-known PID tuning formulasHo, W.K. ; Gan, O.P.; Tay, E.B. ; Ang, E.L.
82Jan-2010Performance-based optical proximity correction methodologyTeh, S.-H.; Heng, C.-H. ; Tay, A. 
832007Piezo-assisted intra-cytoplasmic sperm injection: A comparative study of two penetration techniquesPutra, A.S. ; Huang, S. ; Tan, K.K. ; Panda, S.K. ; Lee, T.H. ; Tay, A. ; Ng, S.C. 
42009Predictive ratio control for interacting processesTan, K.K. ; Tay, A. ; Shao, Z. ; Huang, S. ; Lee, T.H. 
5Jan-2004Processing chemically amplified resists on advanced photomasks using a thermal arraySchaper, C.D.; El-Awady, K.; Kailath, T.; Tay, A. ; Lee, L.L.; Ho, W.-K. ; Fuller, S.E.
6Jun-2009Public goods provision: An evolutionary game theoretic study under asymmetric informationQuek, H.-Y.; Tan, K.C. ; Tay, A. 
72020Rapid Geriatric Assessment Using Mobile App in Primary Care: Prevalence of Geriatric Syndromes and Review of Its FeasibilityMerchant, R.A.; Hui, R.J.Y.; Kwek, S.C.; Sundram, M.; Tay, A. ; Jayasundram, J.; Chen, M.Z.; Ng, S.E.; Tan, L.F.; Morley, J.E.
82013RBF-based compensation method on displacement and thermal errorTan, K.K. ; Yang, R. ; Er, P.V.; Tay, A. ; Teo, C.S.
92005Real-time control of photoresist absorption coefficient uniformityTay, A. ; Ho, W.-K. ; Wu, X.; Tsai, K.-Y.
102005Real-time control of photoresist development processTay, A. ; Ho, W.-K. ; Kiew, C.-M.; Zhou, Y.; Lee, J.H.
11Jan-2007Real-time control of photoresist extinction coefficient uniformity in the microlithography processTay, A. ; Ho, W.K. ; Wu, X.
122008Real-time estimation and control of CD uniformity in lithographyTay, A. 
132007Real-time estimation and control of photoresist properties in microlithographyWu, X.; Tay, A. ; Ho, W.K. ; Tan, K.K. 
142006Real-time monitoring of photoresist thickness contour in microlithographyHo, W.K. ; Chen, X.; Wu, X.; Tay, A. 
152007Real-time spatial control of photoresist development rateTay, A. ; Ho, W.-K. ; Hu, N.; Kiew, C.-M.; Tsai, K.-Y.
162006Real-time spatial control of steady-state wafer temperature during thermal processing in microlithographyTay, A. ; Ho, W.-K. ; Hu, N.; Tsai, K.-Y.; Zhou, Y.
172018Regression analysis of gait parameters and mobility measures in a healthy cohort for subject-specific normative valuesMikos V. ; Yen S.-C. ; Tay A. ; Heng C.-H. ; Chung C.L.H.; Liew S.H.X.; Tan D.M.L. ; Au W.L. 
18Aug-2002Resist film uniformity in the microlithography processHo, W.K. ; Lee, L.L.; Tay, A. ; Schaper, C.
192006Robust real-time thin film thickness estimationKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Lee, J.H.
202002Run-to-run process control for chemical mechanical polishing in semiconductor manufacturingDa, L.; Kumar, V.G.; Tay, A. ; Al Mamun, A. ; Ho, W.K. ; See, A.; Chan, L.