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|Title:||Predictive ratio control for interacting processes||Authors:||Tan, K.K.
|Issue Date:||2009||Citation:||Tan, K.K., Tay, A., Shao, Z., Huang, S., Lee, T.H. (2009). Predictive ratio control for interacting processes. Industrial and Engineering Chemistry Research 48 (23) : 10515-10521. ScholarBank@NUS Repository. https://doi.org/10.1021/ie900219u||Abstract:||In this paper, a predictive-PID ratio control scheme is developed for multivariable processes. The Generalized predictive control based PID configuration is incorporated into various conventional ratio control schemes. Conventional parallel and series ratio control cannot satisfy the stringent requirements. The proposed method is applied to the wafer temperature uniformity control in the lithography. Both simulation and experimental results show the effectiveness of the proposed predictive ratio control method. © 2009 American Chemical Society.||Source Title:||Industrial and Engineering Chemistry Research||URI:||http://scholarbank.nus.edu.sg/handle/10635/57114||ISSN:||08885885||DOI:||10.1021/ie900219u|
|Appears in Collections:||Staff Publications|
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