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Ee Beng, Arthur Tay

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Full Name
Ee Beng, Arthur Tay
Variants
Tay, Arthur
Tay, A.
Tay, E.B.
 
Main Affiliation
 
Faculty
 
Email
eletaya@nus.edu.sg
 

Publications

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Author:  Tay, A.
Subject:  Temperature control

Results 1-20 of 20 (Search time: 0.007 seconds).

Issue DateTitleAuthor(s)
1Apr-2009A heater plate assisted bake/chill system for photoresist processing in photolithographyChua, H.T.; Tay, A. ; Wang, Y.; Wu, X.
2Feb-2007A lamp thermoelectricity based integrated bake/chill system for photoresist processingTay, A. ; Chua, H.T.; Wu, X.
3Feb-2007An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithographyTay, A. ; Ho, W.K. ; Hu, N.
42008CD uniformity control via real-time control of photoresist propertiesChen, M.; Fu, J. ; Ho, W.K. ; Tay, A. 
5Feb-2004Constraint feedforward control for thermal processing of quartz photomasks in microelectronics manufacturingTay, A. ; Ho, W.K. ; Schaper, C.D.; Lee, L.L.
615-Jan-2006Control of photoresist film thickness: Iterative feedback tuning approachTay, A. ; Khuen Ho, W. ; Deng, J.; Keng Lok, B.
7Mar-2010Equipment design and control of advanced thermal-processing module in lithographyTay, A. ; Chua, H.T.; Wang, Y.; Ngo, Y.S.
82005In-situ fault detection of wafer warpage in lithographyTay, A. ; Ho, W.K. ; Yap, C. ; Wei, C.; Tsai, K.-Y.
92005In-situ measurement & control of photoresist development in microlithographyKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Zhou, Y.
102009In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequenceWu, X.; Yang, G.; Lim, E.-X.; Tay, A. 
112008In-situ real-time temperature control of baking systems in lithographyWang, Y.; Chua, H.-T.; Tay, A. 
12Nov-2001Minimum time control of conductive heating systems for microelectronics processingTay, A. ; Ho, W.K. ; Poh, Y.P.
132000Minimum-time optimal feedforward control of conductive heating systems for microelectronics processing of silicon wafers and quatz photomasksHo, W.K. ; Tay, A. 
142000Minimum-time optimal feedforward control of conductive heating systems for microelectronics processing of silicon wafers and quatz photomasksHo, W.K. ; Tay, A. 
15Jul-2004On control of resist film uniformity in the microlithography processHo, W.K. ; Tay, A. ; Lee, L.L.; Schaper, C.D.
162005Real-time control of photoresist absorption coefficient uniformityTay, A. ; Ho, W.-K. ; Wu, X.; Tsai, K.-Y.
172005Real-time control of photoresist development processTay, A. ; Ho, W.-K. ; Kiew, C.-M.; Zhou, Y.; Lee, J.H.
18Jan-2007Real-time control of photoresist extinction coefficient uniformity in the microlithography processTay, A. ; Ho, W.K. ; Wu, X.
192007Real-time spatial control of photoresist development rateTay, A. ; Ho, W.-K. ; Hu, N.; Kiew, C.-M.; Tsai, K.-Y.
202001Spatially-programmable thermal processing module for 300 mm wafer processingTay, A. ; Khiang Wee Lim; Ai Poh Loh; Woei Wan Tan; Weng Khuen Ho; Huang, A. ; Fu, J.