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Weng Khuen Ho

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Full Name
Weng Khuen Ho
Variants
Ho, W.-K.
Ho, Weng-Khuen
Khuen, Ho Weng
Ho, M.
Ho, Weng Khuen
Khuen Ho, W.
Ho, W.Y.
Khuen, H.W.
Ho, W.K.
 
Main Affiliation
 
Faculty
 
Email
elehowk@nus.edu.sg
 

Publications

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Department:  COLLEGE OF DESIGN AND ENGINEERING

Results 81-100 of 119 (Search time: 0.005 seconds).

Issue DateTitleAuthor(s)
812000Optimal predictive control with constraints for the processing of semiconductor wafers on bake platesHo, W.K. ; Tay, A. ; Schaper, C.D.
821996Performance and gain and phase margins of well-known PID tuning formulasHo, W.K. ; Gan, O.P.; Tay, E.B. ; Ang, E.L.
831996Performance and gain and phase margins of well-known PID tuning formulasHo, W.K. ; Gan, O.P.; Tay, E.B. ; Ang, E.L.
841998PID tuning for unstable processes based on gain and phase-margin specificationsHo, W.K. ; Xu, W.
851998PID tuning for unstable processes based on gain and phase-margin specificationsHo, W.K. ; Xu, W.
86Jan-2004Processing chemically amplified resists on advanced photomasks using a thermal arraySchaper, C.D.; El-Awady, K.; Kailath, T.; Tay, A. ; Lee, L.L.; Ho, W.-K. ; Fuller, S.E.
872005Real-time control of photoresist absorption coefficient uniformityTay, A. ; Ho, W.-K. ; Wu, X.; Tsai, K.-Y.
882005Real-time control of photoresist development processTay, A. ; Ho, W.-K. ; Kiew, C.-M.; Zhou, Y.; Lee, J.H.
89Jan-2007Real-time control of photoresist extinction coefficient uniformity in the microlithography processTay, A. ; Ho, W.K. ; Wu, X.
902000Real-time control of photoresist thickness uniformity during the bake processLay, Lee Lay; Schaper, Charles; Khuen, Ho Weng 
912007Real-time estimation and control of photoresist properties in microlithographyWu, X.; Tay, A. ; Ho, W.K. ; Tan, K.K. 
922006Real-time monitoring of photoresist thickness contour in microlithographyHo, W.K. ; Chen, X.; Wu, X.; Tay, A. 
932007Real-time spatial control of photoresist development rateTay, A. ; Ho, W.-K. ; Hu, N.; Kiew, C.-M.; Tsai, K.-Y.
942006Real-time spatial control of steady-state wafer temperature during thermal processing in microlithographyTay, A. ; Ho, W.-K. ; Hu, N.; Tsai, K.-Y.; Zhou, Y.
951991Realization of an expert system based PID controller using industry standard software and hardware environmentsYue, P.K. ; Lee, T.H. ; Hang, C.C. ; Ho, W.K. 
96Oct-2021Recursive maximum likelihood estimation with t-distribution noise modelSun, Lu; Ho, Weng Khuen ; Ling, Keck Voon; Chen, Tengpeng; Maciejowski, Jan
97Mar-1991Refinements of the Ziegler-Nichols tuning formulaHang, C.C. ; Astrom, K.J.; Ho, W.K. 
98Jan-2003Relay auto-tuning of PID controllers using iterative feedback tuningHo, W.K. ; Hong, Y.; Hansson, A.; Hjalmarsson, H.; Deng, J.W.
99Aug-2002Resist film uniformity in the microlithography processHo, W.K. ; Lee, L.L.; Tay, A. ; Schaper, C.
1002006Robust real-time thin film thickness estimationKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Lee, J.H.