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Weng Khuen Ho

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Full Name
Weng Khuen Ho
Variants
Ho, W.-K.
Ho, Weng-Khuen
Khuen, Ho Weng
Ho, M.
Ho, Weng Khuen
Khuen Ho, W.
Ho, W.Y.
Khuen, H.W.
Ho, W.K.
 
Main Affiliation
 
Faculty
 
Email
elehowk@nus.edu.sg
 

Publications

Refined By:
Author:  Ho, W.-K.
Department:  COLLEGE OF DESIGN AND ENGINEERING
Date Issued:  [2000 TO 2009]

Results 41-60 of 69 (Search time: 0.006 seconds).

Issue DateTitleAuthor(s)
4115-Apr-2005Neural network systems for multi-dimensional temporal pattern classificationSrinivasan, R. ; Wang, C.; Ho, W.K. ; Lim, K.W. 
42Jul-2004On control of resist film uniformity in the microlithography processHo, W.K. ; Tay, A. ; Lee, L.L.; Schaper, C.D.
4316-Oct-2008On solving multiobjective bin packing problems using evolutionary particle swarm optimizationLiu, D.S.; Tan, K.C. ; Huang, S.Y.; Goh, C.K.; Ho, W.K. 
442006On solving multiobjective bin packing problems using particle swarm optimizationLiu, D.S.; Tan, K.C. ; Goh, C.K.; Ho, W.K. 
4523-May-2007Optimal feed-forward control for multizone baking in microlithographyHo, W.K. ; Tay, A. ; Chen, M.; Kiew, C.M.
462000Optimal predictive control with constraints for the processing of semiconductor wafers on bake platesHo, W.K. ; Tay, A. ; Schaper, C.D.
47Jan-2004Processing chemically amplified resists on advanced photomasks using a thermal arraySchaper, C.D.; El-Awady, K.; Kailath, T.; Tay, A. ; Lee, L.L.; Ho, W.-K. ; Fuller, S.E.
482005Real-time control of photoresist absorption coefficient uniformityTay, A. ; Ho, W.-K. ; Wu, X.; Tsai, K.-Y.
492005Real-time control of photoresist development processTay, A. ; Ho, W.-K. ; Kiew, C.-M.; Zhou, Y.; Lee, J.H.
50Jan-2007Real-time control of photoresist extinction coefficient uniformity in the microlithography processTay, A. ; Ho, W.K. ; Wu, X.
512000Real-time control of photoresist thickness uniformity during the bake processLay, Lee Lay; Schaper, Charles; Khuen, Ho Weng 
522007Real-time estimation and control of photoresist properties in microlithographyWu, X.; Tay, A. ; Ho, W.K. ; Tan, K.K. 
532006Real-time monitoring of photoresist thickness contour in microlithographyHo, W.K. ; Chen, X.; Wu, X.; Tay, A. 
542007Real-time spatial control of photoresist development rateTay, A. ; Ho, W.-K. ; Hu, N.; Kiew, C.-M.; Tsai, K.-Y.
552006Real-time spatial control of steady-state wafer temperature during thermal processing in microlithographyTay, A. ; Ho, W.-K. ; Hu, N.; Tsai, K.-Y.; Zhou, Y.
56Jan-2003Relay auto-tuning of PID controllers using iterative feedback tuningHo, W.K. ; Hong, Y.; Hansson, A.; Hjalmarsson, H.; Deng, J.W.
57Aug-2002Resist film uniformity in the microlithography processHo, W.K. ; Lee, L.L.; Tay, A. ; Schaper, C.
582006Robust real-time thin film thickness estimationKiew, C.M.; Tay, A. ; Ho, W.K. ; Lim, K.W. ; Lee, J.H.
59Feb-2008RTD response time estimation in the presence of temperature variations and its application to semiconductor manufacturingTan, W.W. ; Li, R.F.Y.; Loh, A.P. ; Ho, W.K. 
602002Run-to-run process control for chemical mechanical polishing in semiconductor manufacturingDa, L.; Kumar, V.G.; Tay, A. ; Al Mamun, A. ; Ho, W.K. ; See, A.; Chan, L.