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|Title:||Three-dimensional nanolithography using proton beam writing||Authors:||Van Kan, J.A.
|Issue Date:||25-Aug-2003||Citation:||Van Kan, J.A., Bettiol, A.A., Watt, F. (2003-08-25). Three-dimensional nanolithography using proton beam writing. Applied Physics Letters 83 (8) : 1629-1631. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1604468||Abstract:||Three-dimensional nanolithography was investigated using proton beam writing. When the proton beam interacts with matter it follows an almost straight path. It was observed that the secondary electrons induced by the primary proton beams have low energy and therefore limited range, resulting in minimal proximity effects.||Source Title:||Applied Physics Letters||URI:||http://scholarbank.nus.edu.sg/handle/10635/98400||ISSN:||00036951||DOI:||10.1063/1.1604468|
|Appears in Collections:||Staff Publications|
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