Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1604468
Title: Three-dimensional nanolithography using proton beam writing
Authors: Van Kan, J.A. 
Bettiol, A.A. 
Watt, F. 
Issue Date: 25-Aug-2003
Source: Van Kan, J.A., Bettiol, A.A., Watt, F. (2003-08-25). Three-dimensional nanolithography using proton beam writing. Applied Physics Letters 83 (8) : 1629-1631. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1604468
Abstract: Three-dimensional nanolithography was investigated using proton beam writing. When the proton beam interacts with matter it follows an almost straight path. It was observed that the secondary electrons induced by the primary proton beams have low energy and therefore limited range, resulting in minimal proximity effects.
Source Title: Applied Physics Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/98400
ISSN: 00036951
DOI: 10.1063/1.1604468
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