Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1604468
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dc.titleThree-dimensional nanolithography using proton beam writing
dc.contributor.authorVan Kan, J.A.
dc.contributor.authorBettiol, A.A.
dc.contributor.authorWatt, F.
dc.date.accessioned2014-10-16T09:46:39Z
dc.date.available2014-10-16T09:46:39Z
dc.date.issued2003-08-25
dc.identifier.citationVan Kan, J.A., Bettiol, A.A., Watt, F. (2003-08-25). Three-dimensional nanolithography using proton beam writing. Applied Physics Letters 83 (8) : 1629-1631. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1604468
dc.identifier.issn00036951
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/98400
dc.description.abstractThree-dimensional nanolithography was investigated using proton beam writing. When the proton beam interacts with matter it follows an almost straight path. It was observed that the secondary electrons induced by the primary proton beams have low energy and therefore limited range, resulting in minimal proximity effects.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.1604468
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.doi10.1063/1.1604468
dc.description.sourcetitleApplied Physics Letters
dc.description.volume83
dc.description.issue8
dc.description.page1629-1631
dc.description.codenAPPLA
dc.identifier.isiut000184844100045
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