Three-dimensional nanolithography using proton beam writing

Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1604468

DC Field	Value
dc.title	Three-dimensional nanolithography using proton beam writing
dc.contributor.author	Van Kan, J.A.
dc.contributor.author	Bettiol, A.A.
dc.contributor.author	Watt, F.
dc.date.accessioned	2014-10-16T09:46:39Z
dc.date.available	2014-10-16T09:46:39Z
dc.date.issued	2003-08-25
dc.identifier.citation	Van Kan, J.A., Bettiol, A.A., Watt, F. (2003-08-25). Three-dimensional nanolithography using proton beam writing. Applied Physics Letters 83 (8) : 1629-1631. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1604468
dc.identifier.issn	00036951
dc.identifier.uri	http://scholarbank.nus.edu.sg/handle/10635/98400
dc.description.abstract	Three-dimensional nanolithography was investigated using proton beam writing. When the proton beam interacts with matter it follows an almost straight path. It was observed that the secondary electrons induced by the primary proton beams have low energy and therefore limited range, resulting in minimal proximity effects.
dc.description.uri	http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.1604468
dc.source	Scopus
dc.type	Article
dc.contributor.department	PHYSICS
dc.description.doi	10.1063/1.1604468
dc.description.sourcetitle	Applied Physics Letters
dc.description.volume	83
dc.description.issue	8
dc.description.page	1629-1631
dc.description.coden	APPLA
dc.identifier.isiut	000184844100045
Appears in Collections:	Staff Publications

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