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https://doi.org/10.1016/S0169-4332(01)00589-X
Title: | In situ RHEED monitor of the growth of epitaxial anatase TiO2 thin films | Authors: | Ong, C.K. Wang, S.J. |
Keywords: | Dielectric thin films Laser deposition Reflection high-energy electron diffraction Surface and interfaces |
Issue Date: | 28-Dec-2001 | Citation: | Ong, C.K., Wang, S.J. (2001-12-28). In situ RHEED monitor of the growth of epitaxial anatase TiO2 thin films. Applied Surface Science 185 (1-2) : 47-51. ScholarBank@NUS Repository. https://doi.org/10.1016/S0169-4332(01)00589-X | Abstract: | Epitaxial anatase TiO2 thin films were successfully grown on (001) SrTiO3 substrates by the laser molecular-beam epitaxy (laser-MBE) method. The whole growth process is monitored by in situ reflection high-energy electron diffraction (RHEED). RHEED monitoring shows a transition from a streaky pattern to a spot pattern during deposition, indicating different growth modes of TiO2 film. The RHEED patterns are in consistent with the RHEED intensity oscillation results. The atomic force microscopy (AFM) and X-ray diffraction (XRD) investigation show that the thin films have single crystalline orientation with roughness less than three unit cells. © 2001 Elsevier Science B.V. All rights reserved. | Source Title: | Applied Surface Science | URI: | http://scholarbank.nus.edu.sg/handle/10635/96894 | ISSN: | 01694332 | DOI: | 10.1016/S0169-4332(01)00589-X |
Appears in Collections: | Staff Publications |
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