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|Title:||Strained germanium-tin (GeSn) N-channel MOSFETs featuring low temperature N +/P junction formation and GeSnO 2 interfacial layer||Authors:||Han, G.
|Issue Date:||2012||Citation:||Han, G.,Su, S.,Wang, L.,Wang, W.,Gong, X.,Yang, Y.,Ivana,Guo, P.,Guo, C.,Zhang, G.,Pan, J.,Zhang, Z.,Xue, C.,Cheng, B.,Yeo, Y.-C. (2012). Strained germanium-tin (GeSn) N-channel MOSFETs featuring low temperature N +/P junction formation and GeSnO 2 interfacial layer. Digest of Technical Papers - Symposium on VLSI Technology : 97-98. ScholarBank@NUS Repository. https://doi.org/10.1109/VLSIT.2012.6242479||Abstract:||GeSn nMOSFETs were demonstrated. Key highlights of this work include 400°C GeSn n +/p junction formation and GeSnO 2 interfacial layer formation, and their integration. GeSn n +/p junction demonstrate a high doping concentration of 10 20 cm -3 and a record high forward bias current of 320 A/cm 2. Substantially improved SS is achieved in GeSn nMOSFET in comparison with Ge control, which indicates the high quality of the GeSnO 2/GeSn interface. © 2012 IEEE.||Source Title:||Digest of Technical Papers - Symposium on VLSI Technology||URI:||http://scholarbank.nus.edu.sg/handle/10635/84231||ISBN:||9781467308458||ISSN:||07431562||DOI:||10.1109/VLSIT.2012.6242479|
|Appears in Collections:||Staff Publications|
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