Enhanced field emission from O2 and CF4 plasma-treated CuO nanowires

Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.cplett.2005.11.087

Title:	Enhanced field emission from O2 and CF4 plasma-treated CuO nanowires
Authors:	Zhu, Y.W. Moo, A.M. Yu, T. Xu, X.J. Gao, X.Y. Liu, Y.J. Lim, C.T. Shen, Z.X. Ong, C.K. Wee, A.T.S. Thong, J.T.L. Sow, C.H.
Issue Date:	26-Feb-2006
Citation:	Zhu, Y.W., Moo, A.M., Yu, T., Xu, X.J., Gao, X.Y., Liu, Y.J., Lim, C.T., Shen, Z.X., Ong, C.K., Wee, A.T.S., Thong, J.T.L., Sow, C.H. (2006-02-26). Enhanced field emission from O2 and CF4 plasma-treated CuO nanowires. Chemical Physics Letters 419 (4-6) : 458-463. ScholarBank@NUS Repository. https://doi.org/10.1016/j.cplett.2005.11.087
Abstract:	The effects of tetrafluoro methane (CF4) and oxygen (O 2) plasmas on the morphology and field emission of copper oxide (CuO) nanowires are investigated. The tip diameter of nanowires is found to be reduced and the tips sharpened by both plasmas. Furthermore, O2 plasma removes the amorphous layer on the surface of as-grown nanowires, while CF4 plasma treatment deposits a thick amorphous coating which results in a decrease in the surface work function. All these factors contribute to the large enhancement of the field emission performance after the plasma treatment. © 2005 Elsevier B.V. All rights reserved.
Source Title:	Chemical Physics Letters
URI:	http://scholarbank.nus.edu.sg/handle/10635/82284
ISSN:	00092614
DOI:	10.1016/j.cplett.2005.11.087
Appears in Collections:	Staff Publications

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