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Title: Effects of CF4 plasma on the field emission properties of aligned multi-wall carbon nanotube films
Authors: Zhu, Y.W. 
Cheong, F.C. 
Yu, T. 
Xu, X.J. 
Lim, C.T. 
Thong, J.T.L. 
Shen, Z.X. 
Ong, C.K. 
Liu, Y.J. 
Wee, A.T.S. 
Sow, C.H. 
Keywords: A. Carbon nanotubes
B. Etching
D. Field emission
Issue Date: 2005
Citation: Zhu, Y.W., Cheong, F.C., Yu, T., Xu, X.J., Lim, C.T., Thong, J.T.L., Shen, Z.X., Ong, C.K., Liu, Y.J., Wee, A.T.S., Sow, C.H. (2005). Effects of CF4 plasma on the field emission properties of aligned multi-wall carbon nanotube films. Carbon 43 (2) : 395-400. ScholarBank@NUS Repository.
Abstract: We present a simple method to functionalize the surface and to modify the structures of aligned multi-wall carbon nanotube (CNT) arrays grown on silicon substrates using CF4 plasma produced by reactive ion etching (RIE). Field emission (FE) measurements showed that after 2 min of plasma treatment, the emission currents were enhanced compared with as-grown CNTs; however, extended treatment over 2 min was found to degrade the FE properties of the film. Scanning electron microscopy, transmission electron microscopy, X-ray photoelectron spectroscopy and Raman spectroscopy have been employed to investigate the mechanism behind the modified FE properties of the CNT film. The FE enhancement after 2 min of etching could be attributed to favorable surface morphologies, open-ended structures and a large number of defects in the aligned CNT films. On the other hand, deposition of an amorphous layer comprising carbon and fluorine during extended CF4 plasma treatment may hamper the field emission of CNT films. © 2004 Elsevier Ltd. All rights reserved.
Source Title: Carbon
ISSN: 00086223
DOI: 10.1016/j.carbon.2004.09.029
Appears in Collections:Staff Publications

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