Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.carbon.2004.09.029
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dc.titleEffects of CF4 plasma on the field emission properties of aligned multi-wall carbon nanotube films
dc.contributor.authorZhu, Y.W.
dc.contributor.authorCheong, F.C.
dc.contributor.authorYu, T.
dc.contributor.authorXu, X.J.
dc.contributor.authorLim, C.T.
dc.contributor.authorThong, J.T.L.
dc.contributor.authorShen, Z.X.
dc.contributor.authorOng, C.K.
dc.contributor.authorLiu, Y.J.
dc.contributor.authorWee, A.T.S.
dc.contributor.authorSow, C.H.
dc.date.accessioned2014-10-07T04:26:49Z
dc.date.available2014-10-07T04:26:49Z
dc.date.issued2005
dc.identifier.citationZhu, Y.W., Cheong, F.C., Yu, T., Xu, X.J., Lim, C.T., Thong, J.T.L., Shen, Z.X., Ong, C.K., Liu, Y.J., Wee, A.T.S., Sow, C.H. (2005). Effects of CF4 plasma on the field emission properties of aligned multi-wall carbon nanotube films. Carbon 43 (2) : 395-400. ScholarBank@NUS Repository. https://doi.org/10.1016/j.carbon.2004.09.029
dc.identifier.issn00086223
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/82222
dc.description.abstractWe present a simple method to functionalize the surface and to modify the structures of aligned multi-wall carbon nanotube (CNT) arrays grown on silicon substrates using CF4 plasma produced by reactive ion etching (RIE). Field emission (FE) measurements showed that after 2 min of plasma treatment, the emission currents were enhanced compared with as-grown CNTs; however, extended treatment over 2 min was found to degrade the FE properties of the film. Scanning electron microscopy, transmission electron microscopy, X-ray photoelectron spectroscopy and Raman spectroscopy have been employed to investigate the mechanism behind the modified FE properties of the CNT film. The FE enhancement after 2 min of etching could be attributed to favorable surface morphologies, open-ended structures and a large number of defects in the aligned CNT films. On the other hand, deposition of an amorphous layer comprising carbon and fluorine during extended CF4 plasma treatment may hamper the field emission of CNT films. © 2004 Elsevier Ltd. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.carbon.2004.09.029
dc.sourceScopus
dc.subjectA. Carbon nanotubes
dc.subjectB. Etching
dc.subjectD. Field emission
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.contributor.departmentMECHANICAL ENGINEERING
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.contributor.departmentNUS NANOSCIENCE & NANOTECH INITIATIVE
dc.description.doi10.1016/j.carbon.2004.09.029
dc.description.sourcetitleCarbon
dc.description.volume43
dc.description.issue2
dc.description.page395-400
dc.description.codenCRBNA
dc.identifier.isiut000225856400021
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