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Title: | Effects of tungsten silicidation on Fowler-Nordheim tunnelling current and charge trapping in polysilicon-oxide-silicon capacitors | Authors: | Ling, C.H. Ooi, J.A. Ang, D.S. |
Keywords: | MOS capacitors Tunnelling |
Issue Date: | 1996 | Citation: | Ling, C.H.,Ooi, J.A.,Ang, D.S. (1996). Effects of tungsten silicidation on Fowler-Nordheim tunnelling current and charge trapping in polysilicon-oxide-silicon capacitors. Electronics Letters 32 (10) : 933-934. ScholarBank@NUS Repository. | Abstract: | Results of Fowler-Nordheim current stress are compared for tungsten polycided and non-polycided gate MOS capacitors. An initial high pre-tunnelling current, decreasing with subsequent gate bias scan, is reported for non-polycided device tunnelling from the gate. This is attributed to the charging of oxide electron traps. A temperature anneal at 200°C demonstrates that these traps are rechargeable. | Source Title: | Electronics Letters | URI: | http://scholarbank.nus.edu.sg/handle/10635/62103 | ISSN: | 00135194 |
Appears in Collections: | Staff Publications |
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