Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/53293
Title: High aspect ratio metamaterials for enhanced tunability and sensitivity
Authors: Chiam, S.-Y. 
Bahou, M. 
Moser, H.O. 
Gu, J.
Singh, R.
Zhang, W.
Han, J. 
Bettiol, A.A. 
Issue Date: 2009
Citation: Chiam, S.-Y.,Bahou, M.,Moser, H.O.,Gu, J.,Singh, R.,Zhang, W.,Han, J.,Bettiol, A.A. (2009). High aspect ratio metamaterials for enhanced tunability and sensitivity. 2009 Conference on Lasers and Electro-Optics and 2009 Conference on Quantum Electronics and Laser Science Conference, CLEO/QELS 2009 : -. ScholarBank@NUS Repository.
Abstract: Using a proton beam based lithography process, we fabricate and study high aspect ratio metamaterials, revealing distinct 3-dimensional resonances. Increased aspect ratio also leads to enhanced tunability and sensitivity for practical applications. © 2008 Optical Society of America.
Source Title: 2009 Conference on Lasers and Electro-Optics and 2009 Conference on Quantum Electronics and Laser Science Conference, CLEO/QELS 2009
URI: http://scholarbank.nus.edu.sg/handle/10635/53293
ISBN: 9781557528698
Appears in Collections:Staff Publications

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