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|Title:||High aspect ratio metamaterials for enhanced tunability and sensitivity||Authors:||Chiam, S.-Y.
|Issue Date:||2009||Citation:||Chiam, S.-Y.,Bahou, M.,Moser, H.O.,Gu, J.,Singh, R.,Zhang, W.,Han, J.,Bettiol, A.A. (2009). High aspect ratio metamaterials for enhanced tunability and sensitivity. 2009 Conference on Lasers and Electro-Optics and 2009 Conference on Quantum Electronics and Laser Science Conference, CLEO/QELS 2009 : -. ScholarBank@NUS Repository.||Abstract:||Using a proton beam based lithography process, we fabricate and study high aspect ratio metamaterials, revealing distinct 3-dimensional resonances. Increased aspect ratio also leads to enhanced tunability and sensitivity for practical applications. © 2008 Optical Society of America.||Source Title:||2009 Conference on Lasers and Electro-Optics and 2009 Conference on Quantum Electronics and Laser Science Conference, CLEO/QELS 2009||URI:||http://scholarbank.nus.edu.sg/handle/10635/53293||ISBN:||9781557528698|
|Appears in Collections:||Staff Publications|
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