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|Title:||Modification of Si(100) surface by plasma-enhanced graft polymerization of allylpentafluorobenzene||Authors:||Zou, X.P.
|Issue Date:||2001||Citation:||Zou, X.P., Kang, E.T., Neoh, K.G., Huang, W. (2001). Modification of Si(100) surface by plasma-enhanced graft polymerization of allylpentafluorobenzene. Journal of Adhesion Science and Technology 15 (13) : 1655-1672. ScholarBank@NUS Repository. https://doi.org/10.1163/156856101753207733||Abstract:||Hydrophobic fluoropolymer thin films were deposited on Si(100) substrates by plasma polymerization of allylpentafluorobenzene (APFB) under different glow discharge conditions, and in the presence and absence of Ar plasma pre-activation of the substrate surfaces. The FTIR and X-ray photoelectron spectroscopy (XPS) results suggested that the plasma polymerization proceeded mainly through the C=C bond of APFB, and the fluorinated aromatic structure in the deposited polymer films was preserved to different extents, depending on the radio-frequency (RF) power used for plasma polymerization. The use of a low RF power (∼5 W) readily resulted in the deposition of thin films having nearly the same fluorinated aromatic structure as that of the APFB homopolymer. For the plasma-polymerized APFB (pp-APFB) films deposited on the Ar plasma-preactivated Si(100) surfaces, solvent extraction results suggested that the pp-APFB films became covalently tethered onto the silicon substrate surfaces. Thermogravimetric (TG) analysis results indicated that the thermal stability of the pp-APFB films had been enhanced substantially after annealing at 270°C in a vacuum oven.||Source Title:||Journal of Adhesion Science and Technology||URI:||http://scholarbank.nus.edu.sg/handle/10635/52670||ISSN:||01694243||DOI:||10.1163/156856101753207733|
|Appears in Collections:||Staff Publications|
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